Abstract:Possible dissociative adsorptions of organic molecules such as CH3OH (CH3NH2) to form CH3O . . .H or CH3. . . OH (CH3NH . . .H or CH3. . . NH2) on the Si(100)-2 x 1 surface are discussed by using the hybrid density functional B3LYP method. The Si9H12 cluster is used as a model of the Si(100)-2 x I surface. First, a CH3OH adsorbs molecularly on the Si(100)-2 x 1 surface with no barrier and its stabilization energy is estimated to be 14 kcal/mol. Next, the molecularly adsorbed CH3OH dissociates to CH3O . . .H or CH3. . . OH. The activation energies to form CH3O . . .H/Si9H12 and CH3. . . OH/Si9H12 from the molecularly adsorbed CH3OH/Si9H12 are calculated to be 3.8 and 27.8 kcal/mol, respectively. The transition states in these reactions lie 10.5 kcal/mol below and 14.0 kcal/mol above the energy of the initial state (isolated bare Si9H12 cluster + CH3OH molecule), respectively, and thus the former reaction has no barrier to dissociative chemisorption and will occur under milder conditions than the latter. The overall exthothermicity from initial state is calculated to be 65.3 kcal/mol in the former reaction, while 80.9 kcal/mol in the latter reaction and thus the product in the latter reaction is more stable than in the former reaction. Therefore, the former reaction would proceed under mild conditions while the latter reaction would proceed under severe conditions. Same results are obtained in the case of the dissociative adsorptions of CH3NH2 on the Si(100)-2 x 1 surface; the dissociatively adsorbed CH3NH . . .H/Si9H12 is more likely to be produced under mild conditions while the dissociatively adsorbed CH3. . . NH2/Si9H12 is more likely to be produced under severe conditions. Orbital interactions and charge transfers have been analyzed to clarify the differences of the adsorption mechanisms. Significant negative charge transfer from the silicon surface to the CH3OH and CH3NH2 molecules is the main reason these molecules dissociatively adsorb on the silicon surface in a reductive manner.

Chemisorption and Decomposition of Thiophene and Furan on the Si(100)-2 × 1 Surface: A Quantum Chemical Study

Theoretical studies of the structure of C 2H 2 adsorbed on Si(0 0 1)

Theoretical studies of the structure of C2H2 adsorbed on Si(001)

Electronic and Vibrational Properties of Thiophene on Si(100)

Cycloaddition Reaction of Furan with Si(100)-2×1

The Chemisorption of Tetracene on Si(100)-2x1 Surface

Adsorption configurations of furan molecule on Si(100)-2×1 surface by X-ray photoelectron spectroscopy and near-edge X-ray absorption fine structure spectra

Cycloaddition Chemistry of Thiophene on the Silicon (111)-7×7 Surface

Two-Dimensional Hierarchical Supramolecular Assembly of a Silole Derivative and Surface-Assisted Chemical Transformations

Chemisorption Of Acetonitrile, Pyridine And Pyrazine On The Si(100)-2x1 Surface: Theoretical Predictions

Functionalization of Silicon Surface by Thiadiazole Molecule : a DFT Study

Adsorption Geometry of Tetracene on SiO2/Si (111) Substrate with the Balance of Molecule–substrate and Intermolecular Interaction

Adsorption and Thermal Dissociation of Pyrrole on Si(1 0 0)-2 × 1

Adsorption and Desulfurization Mechanism of Thiophene on Layered FeS(001), (011), and (111) Surfaces: A Dispersion-Corrected Density Functional Theory Study

Dative and Di−σ Binding States of Pyridine on Si(100) and Their Thermal Stability

Adsorbate Lone-Pair-electron Stimulated Charge Transfer Between Surface Dangling Bonds: Methanol Chemisorption on Si(1 1 1)-7 × 7

Interaction Of Tetraethoxysilane With Oh-Terminated Sio2 (001) Surface: A First Principles Study

Theoretical study of the chemisorption of benzene on Si(111)-7x7 surface

Adsorption of Phenylacetylene on Si(100)-2×1: Reaction Mechanism and Formation of a Styrene-Like Π-Conjugation System

Chemisorption Induced Formation of Biphenylene Dimer on Surfaces

Possible Dissociative Adsorption Of Ch3oh And Ch3nh2 On Si(100)-2 X 1 Surface