Abstract:The chemical binding of pyrrolidine on Si(111)-7 x 7 was studied using high-resolution electron energy loss spectroscopy (HREELS), X-ray photoelectron spectroscopy (XPS), and DFT calculation, to obtain a thorough mechanistic understanding of the formation of dative bonds of nitrogen-containing organic molecules on semiconductor surfaces. This study focuses on the electronic and geometric structures of the surface reactive sites. XPS of a chemisorbed monolayer suggests two adsorbates (beta 1 and beta 2) associated with the formation of a N center dot center dot center dot Si-ad dative bond. At low exposure, the adsorbate beta 1 forms a dative bond as indicated by a higher N1s binding energy compared to the Si-N sigma bond in the dissociated product formed at 250 K. At higher exposure, the formation of the second N center dot center dot center dot Si-ad dative bond in adsorbate beta 2 was evidenced by an obvious upshift of the N1s core-level in contrast to that observed for physisorbed molecules or Si-N sigma-bonded molecules. Vibrational studies show a down-shift of the N-H stretching frequency by similar to 95 cm(-1) upon the formation of the N center dot center dot center dot Si-ad dative bond in contrast to the free pyrrolidine molecule, providing new evidence for the dative bonding between amines and silicon surfaces. These studies suggest that the beta 2 state is an adsorbate directly bonded to the silicon surface adatom via the formation of a N center dot center dot center dot Si-ad dative bond, and the beta 1 state is an adsorbate which forms a N center dot center dot center dot Si-ad dative bond with an adatom and a weak N-H center dot center dot center dot Si-re hydrogen bond with an adjacent electron-rich rest atom. In the beta 1 adsorbate, both electron acceptance by the adatom and electron donation by the rest atom occur simultaneously with one pyrrolidine molecule through dative bonding and hydrogen bonding, respectively. The extra electron-deficient adatom sites on Si(111)-7 x 7 provide an opportunity for forming a second dative bond after the formation of the first in contrast to Ge(100) and Si(100) where the number of electron-deficient and electron-rich sites are equivalent. The difference in electronic and geometric structures of the reactive sites on different semiconductor surfaces offers a useful channel to shape reactivity and selectivity of organic functional groups on silicon surfaces.

Electronic and Vibrational Properties of Thiophene on Si(100)

Theoretical studies of the structure of C2H2 adsorbed on Si(001)

Theoretical studies of the structure of C 2H 2 adsorbed on Si(0 0 1)

Cycloaddition Chemistry of Thiophene on the Silicon (111)-7×7 Surface

Chemisorption and Decomposition of Thiophene and Furan on the Si(100)-2 × 1 Surface: A Quantum Chemical Study

The Chemisorption of Tetracene on Si(100)-2x1 Surface

Functionalization of Silicon Surface by Thiadiazole Molecule : a DFT Study

Adsorption and Thermal Dissociation of Pyrrole on Si(1 0 0)-2 × 1

Adsorption Geometry of Tetracene on SiO2/Si (111) Substrate with the Balance of Molecule–substrate and Intermolecular Interaction

Adsorption of Phenylacetylene on Si(100)-2×1: Reaction Mechanism and Formation of a Styrene-Like Π-Conjugation System

Interaction Of Tetraethoxysilane With Oh-Terminated Sio2 (001) Surface: A First Principles Study

DFT Investigations about Pyrazine Molecules on Si(100)-2×1 Surface

Dative and Di−σ Binding States of Pyridine on Si(100) and Their Thermal Stability

Lying or Standing of Thiophene on a Surface Determines the Reaction Difference

INTERACTION BETWEEN Li ATOMS ON Si(100)2×1 AND PHASE CHANGE OF SURFACE STRUCTURE

Theoretical Studies of Benzonitrile at the Si(100)-2 X 1 Surface

Transfer of Electron Density and Formation of Dative Bonds in Chemisorption of Pyrrolidine on Si(111)-7 × 7

Interfacial Electronic States of Tetracene Deposited on Si(111).

Interaction of tetraethoxysilane with OH-terminated SiO 2 (0 0 1) surface: A first principles study

Coverage Dependent Structural Change in Tetrahydrothiophene Adsorbed on Ge(100) Surface

Effect of alkyl substituents on the adsorption of thienylenevinylene oligomers on the Si (100) surface