Degradation Behavior of Etch-Stopper-Layer Structured A-Ingazno Thin-Film Transistors under Hot-Carrier Stress and Illumination

Dong Lin,Wan-Ching Su,Chang,Hong-Chih Chen,Yu-Fa Tu,Kuan-Ju Zhou,Yang-Hao Hung,Jianwen Yang,I-Nien Lu,Tsung-Ming Tsai,Qun Zhang
DOI: https://doi.org/10.1109/ted.2020.3047015
IF: 3.1
2021-01-01
IEEE Transactions on Electron Devices
Abstract:Etch-stopper-layer (ESL) structured amorphous InGaZnO thin-film transistors (a-IGZO TFTs) were fabricated in this article. Degradation behavior of the a-IGZO TFTs under hot-carrier stress and illumination (HCIS) was investigated. As HCIS time increases, the transfer curve in the saturation region shifts in the negative direction under the forward-operation mode, whereas it shifts in the positive direction under the reverse-operation mode. The HCIS-induced degradation behavior was attributed to charge trapping in the IGZO/ESL interface. To examine the degradation mechanism, the capacitance-voltage measurements were performed. After applying HCIS, it is found that the gate-to-drain capacitance curve shifts in the positive direction and the gate-to-source capacitance curve exhibits two-stage rises. Technology computer-aided design (TCAD) was used to simulate the electric field distribution during the stress, which also confirmed the proposed mechanism.
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