Abstract:The ion beam sputtering (IBS) of smooth mono-elemental Si with impurity co-deposition is extended to a pre-rippled binary compound surface of fused silica (SiO2). The dependence of the rms roughness and the deposited amount of Al on the distance from the Al source under Ar+ IBS with Al co-deposition was investigated on smooth SiO2, pre-rippled SiO2, and smooth Si surfaces, using atomic force microscopy and X-ray photoelectron spectroscopy. Although the amounts of Al deposited on these three surfaces all decreased with increasing distance from the Al target, the morphology and rms roughness of the smooth Si surface did not demonstrate a strong distance dependence. In contrast to smooth Si, the rms roughness of both the smooth and pre-rippled SiO2 surfaces exhibited a similar distance evolution trend of increasing, decreasing, and final stabilization at the distance where the results were similar to those obtained without Al co-deposition. However, the pre-rippled SiO2 surfaces showed a stronger modulation of rms roughness than the smooth surfaces. At the incidence angles of 60° and 70°, dot-decorated ripples and roof-tiles were formed on the smooth SiO2 surfaces, respectively, whereas nanostructures of closely aligned grains and blazed facets were generated on the pre-rippled SiO2, respectively. The combination of impurity co-deposition with pre-rippled surfaces was found to facilitate the formation of novel types of nanostructures and morphological growth. The initial ripples act as a template to guide the preferential deposition of Al on the tops of the ripples or the ripple sides facing the Al wedge, but not in the valleys between the ripples, leading to 2D grains and quasi-blazed grating, which offer significant promise in optical applications. The rms roughness enhancement is attributed not to AlSi, but to AlOxFy compounds originating mainly from the Al source.

Preparation of Subwavelength Nanostructures Based on Low-Energy Ion Bombardment

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Focused Ion Beam Assisted Interface Detection for Fabricating Functional Plasmonic Nanostructures

Characterization of Ion Beam Induced Nanoripples by Using Extreme Ultraviolet Synchrotron Radiation

Ordered SrTiO 3 Nanoripples Induced by Focused Ion Beam

Solvent-Free Nanofabrication Based on Ice-Assisted Electron-Beam Lithography.

Subwavelength structures for high power laser antireflection application on fused silica by one-step reactive ion etching

Optical anisotropy of metal nanowire arrays on fused silica surface

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Ion beam lithography with gold and silicon ions

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Nanostructuring lithium niobate substrates by focused ion beam milling

Fabrication Of Suspended Periodic Nanostructure By Focused Ion Beam Induced Material Migration And Rayleigh-Plateau Instability

DIRECT FORMATION OF NANOPORE ARRAY VIA FOCUSED ION BEAM FINE MILLING AND SURFACE COATING TECHNIQUES

Surface Modifications of Crystal-Ion-sliced LiNbO3 Thin Films by Low Energy Ion Irradiations

Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

Rapid Focused Ion Beam Milling Based Fabrication of Plasmonic Nanoparticles and Assemblies Via "sketch and Peel" Strategy.

Formation of Fe Nano-Ripples and Nano-Structures on Si Surfaces Induced by Ion bombardment

Fabrication of nanostructured hydrophobic surfaces with laser interference lithography

Large area buried nanopatterning by broad ion implantation without any mask or direct writing

Tailored engineering of crystalline surface enabled by ion-irradiation-assisted femtosecond laser ablation