Abstract:Fused silica is widely used in aerospace and precision integrated micro-optical sensors due to its high hardness, low coefficient of thermal expansion, high transmittance properties and high chemical stability in harsh environments. Due to the amorphous characteristics, fused silica wet etching is isotropic and cannot realize specific structural functional devices; dry etching process is complex, costly, and relatively low productivity. These characteristics make the processing of fused silica extremely difficult, with high cost and low yield. Femtosecond laser processing has been widely used in the processing of complex and fine three-dimensional structure of fused silica due to its wide adaptability of materials, high degree of processing fineness and non-mask processing technology, but the surface of the processed surface is relatively rough. Fine micro-optical devices can be realized by wet-assisted femtosecond laser processing. In this study, microstructural patterns were fabricated on fused silica using a tightly focused femtosecond laser by means of a self-developed ultrafast laser processing instrumentation. By controlling the laser processing parameters and the etching time of HF solution to realize the precise modulation of linewidth, period and height of the grating, one/two dimensional gratings, and the Fresnel zone plates with circular and elliptical focal points and the biomimetic compound eye microlens array were successfully fabricated. Finally, the performance of the fabricated optical components were characterized, which were comparable to theoretical simulation values. The results show that the total diffraction efficiency of the fused silica gratings fabricated using this method reaches 85.5%; the Fresnel zone plates and the bionic compound eye microlens array have good focusing effects. This study provides a reference method for the fine micromachining of hard materials such as fused silica, and provides a theoretical basis for its engineering application.

Subwavelength structures for high power laser antireflection application on fused silica by one-step reactive ion etching

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Antireflection subwavelength structures on fused silica fabricated by colloidal microsphere lithography

Formation of Broadband Antireflective and Superhydrophilic Subwavelength Structures on Fused Silica Using One-Step Self-Masking Reactive Ion Etching

Dual-control of incubation effect for efficiently fabricating surface structures in fused silica

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Hybrid micro/nano-structure formation by angular laser texturing of Si surface for surface enhanced Raman scattering.

Maskless Laser Tailoring of Conical Pillar Arrays for Antireflective Biomimetic Surfaces

Research of Femtosecond Laser-Assisted Etching of Fused Silica Micro-Optics Devices

Cylindrically Focused Nonablative Femtosecond Laser Processing of Long‐Range Uniform Periodic Surface Structures with Tunable Diffraction Efficiency

Anisotropic Ion Beam Etching Of Fused Silica To Mitigate Subsurface Damage

Multi-scale Micro-Nano Structures Prepared by Laser Cleaning Assisted Laser Ablation for Broadband Ultralow Reflectivity Silicon Surfaces in Ambient Air

Langmuir−Blodgett Monolayer Masked Chemical Etching: an Approach to Broadband Antireflective Surfaces

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Hierarchical Micro/Nanostructures with Anti-Reflection and Superhydrophobicity on the Silicon Surface Fabricated by Femtosecond Laser

Polarization-insensitive space-selective etching in fused silica induced by picosecond laser irradiation

Rapid fabrication of antireflective structures on ZnS surface by spatial shaping femtosecond laser

Tailored engineering of crystalline surface enabled by ion-irradiation-assisted femtosecond laser ablation

High-throughput Microchannel Fabrication in Fused Silica by Temporally Shaped Femtosecond Laser Bessel-beam-assisted Chemical Etching.

Study of surface wettability on fused silica by ultrafast laser-induced micro/nano-surface structures

Broad-Band Ultra-Low-Reflectivity Multiscale Micro-Nano Structures by the Combination of Femtosecond Laser Ablation and in Situ Deposition