Abstract:Light reflection from surfaces is ubiquitous in nature. Diverse optoelectronic devices need durable, omnidirectional, and transparent ultra-antireflective surfaces. Here, we engineered antireflective transparent surfaces composed of silica nanocaps through a simple thermal treatment of a silica-coated monolayer colloidal crystal template. The relationship between the structure and the antireflective performance of the silica nanocaps was systematically studied both experimentally and numerically. On the basis of the understanding of the structure-antireflection relationships, ultra-antireflection coatings with a transmittance of ∼98.75 ± 0.15% in the visible wavelength range were prepared by fabricating two differently sized silica nanocaps. More importantly, the antireflection of the coatings formed by two differently sized nanocaps demonstrated poor dependence on the angle of the incident light (i.e., omnidirectionality). The reflection is <2.5% even at an incident angle of 60°. The prepared ultra-antireflective silica nanocap coatings outperform state-of-the-art transparent antireflective coatings regarding the antireflection performance, the wavelength range, and the omnidirectionality. The silica nanoshells were welded together with the underlying fused silica. Therefore, they can sustain common mechanical friction and scratching, demonstrating extraordinary mechanical durability as verified by sand abrasion tests. Further, the silanized silica nanocaps turned out to be hydrophobic with an outstanding self-cleaning performance without prominently influencing the transmittance. The durable and omnidirectional ultra-antireflective transparent silica nanocaps will have promising applications in solar energy conversion and storage, displays, optical lenses, and a wide range of optoelectronic devices.

Langmuir−Blodgett Monolayer Masked Chemical Etching: an Approach to Broadband Antireflective Surfaces

A novel trilayer antireflection coating using dip-coating technique

Ultra-Low-Reflective, Self-Cleaning Surface by Fabrication Dual-Scale Hierarchical Optical Structures on Silicon

Tuning the peak position of subwavelength silica nanosphere broadband antireflection coatings.

Fabrication of Large Area Subwavelength Antireflection Structures on Si Using Trilayer Resist Nanoimprint Lithography and Liftoff

Formation of ultralow-reflectance silicon surface by dry etching

Durable Broadband and Omnidirectional Ultra-antireflective Surfaces

Hierarchical Micro/Nanostructures with Anti-Reflection and Superhydrophobicity on the Silicon Surface Fabricated by Femtosecond Laser

Maskless Laser Tailoring of Conical Pillar Arrays for Antireflective Biomimetic Surfaces

Micro/nano structure size effect on superhydrophobicity and anti reflection of single crystalline Si solar cells

High performance hierarchical nanoporous antireflective films by a facile sol–gel process

Study on Silicon Nanopillars with Ultralow Broadband Reflectivity Via Maskless Reactive Ion Etching at Room Temperature

Reflectivity of porous-pyramids structured silicon surface

Fabrication and Characterization of Inverted Silicon Pyramidal Arrays with Randomly Distributed Nanoholes

Fabrication of Anti-reflecting Si Nano-structures with Low Aspect Ratio by Nano-sphere Lithography Technique

Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography

A route to engineered high aspect-ratio silicon nanostructures through regenerative secondary mask lithography

Patternable fabrication of hyper-hierarchical metal surface structures for ultrabroadband antireflection and self-cleaning

Ultralow Broadband Reflectivity in Black Silicon Via Synergy Between Hierarchical Texture and Specific‐Size Au Nanoparticles

Superhydrophobic Silicon Surfaces with Low Light Reflectivity

Atomic layer etching of SiO$_2$ using sequential exposures of Al(CH$_3$)$_3$ and H$_2$/SF$_6$ plasma