Abstract:The nature-inspired flexible and re-entrant liquid-superrepellent surface has attracted significant attention due to its excellent superomniphobic performance against low-surface-tension liquids. Although conventional photolithography and molding methods offer the advantage of large-area manufacturing, they often involve multiple double-sided alignment and exposure steps, resulting in complex procedures with long processing cycles. In this study, we proposed a straightforward single-exposure ultraviolet proximity lithography method for re-entrant liquid-superrepellent surface fabrication using a photomask with a coaxial circular aperture and ring. A theoretical calculation model for the three-dimensional light intensity distribution in proximity lithography was developed for the prediction of feature sizes for both singly and doubly re-entrant microstructures. Soft lithography techniques, which rely on surface modification and the modulation of the transfer material's flexibility, efficiently optimized the fabrication of flexible re-entrant molds and patterns. By incorporating nanoclay-modified poly(N-isopropylacrylamide) (PNIPAM) into the molding process, we fabricated a three-layer hierarchical structure featuring micrometer-scale wrinkles, re-entrant microstructures, and nanoscale fluorinated silica particles, significantly enhancing the surface's robustness and pressure resistance. The resulting large-area flexible and re-entrant liquid-superrepellent surface demonstrated excellent superomniphobic self-cleaning performance and satisfactory optical transparency, as evidenced by reflection and transmission experiments, showcasing its potential applications in self-cleaning, membrane distillation, and digital microfluidics.

Fabrication of nanostructured hydrophobic surfaces with laser interference lithography

Superhydrophobic Dual Micro- And Nanostructures Fabricated By Direct Laser Interference Lithography

Hydrophobic Surface Fabricated by Laser Interference Lithography

Fabrication of nano-scale superhydrophobic surfaces on silicon substrates using direct laser interference patterns(DLIP)

Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching

Controllable fabrication of periodic arrays of high-aspect-ratio micro-nano hierarchical structures and their superhydrophobicity

Large-Area Fabrication of A Nanostructure-Induced Hydrophobic Surface from A Hydrophilic Polymer

Laser Interference Lithography-A Method for the Fabrication of Controlled Periodic Structures

Fabrication of Flexible and Re-entrant Liquid-Superrepellent Surface Using Proximity and PNIPAM-Assisted Soft Lithography

Hierarchical Micro/Nanostructures with Anti-Reflection and Superhydrophobicity on the Silicon Surface Fabricated by Femtosecond Laser

Fabrication of High Aspect Ratio Micro-Structures with Superhydrophobic and Oleophobic Properties by Using Large-Area Roll-to-Plate Nanoimprint Lithography

Superhydrophobic silicon surfaces with micro-nano hierarchical structures via deep reactive ion etching and galvanic etching.

Fabrication of Flexible and Reentrant Liquid-Superrepellent Surfaces Enabled by Proximity and Soft Lithography

The Fabrication Of Nanostructures On Polydimethylsiloxane By Laser Interference Lithography

Highly Efficient Fabrication of Superhydrophilic Structures on Silicon Surface by the Interference of Two Femtosecond Laser Beams

Femtosecond Laser Interference Micro-patterning on Mold Surface to Improve Hydrophobicity for Microfluid Applications

Superhydrophobic Structure Fabricated by Femtosecond Laser on Nickel Surface

Effect of Surface Area on the Wettability of Dual Micro- and Nanostructures Fabricated by Laser Interference Lithography

Fabrication of Super-hydrophobic Surfaces for Microfluidic Chips

Simulation and Fabrication of Nanostructures with Laser Interference Lithography

Lithography-induced Hydrophobic Surfaces of Silicon Wafers with Excellent Anisotropic Wetting Properties