Plasma Nitriding of 2024 Al Alloy Deposited with Ti Film: Effects of N-2-H-2 Ratio on Microstructure Evolution and Mechanical Properties

Fanyong Zhang,Mufu Yan,Chen Lu,Fuxing Yin

DOI: https://doi.org/10.1007/978-981-13-0107-0_1

2018-01-01

Lecture Notes in Mechanical Engineering

Abstract:2024 Al alloys were firstly deposited with pure Ti film (similar to 5.0 mu m in thickness) using magnetron sputtering, then plasma nitrided for 8 h at 490 degrees C under N-2-H-2 gas mixtures with different N2 content (15, 40 and 50%). The Ti-N and Ti-Al diffusion reactions were activated simultaneously on the surface of Al alloy to obtain duplex coatings. The results showed that the duplex coatings were composed of nitride/aluminide layers (TiN0.3/Al3Ti/Al18Ti2Mg3 layers). With increasing the N-2 content in the gas mixture, the peak ratio I-(002)/I-(100) of the outer TiN0.3 phase increased and the nitride particles grew larger. The surface hardness of coatings increased with the increasing N-2-H-2 ratio, reaching the maximum value of 630 HV under 50%N-2 + 50%H-2. The coatings obtained under gas mixture with high N content showed larger fluctuation at the initial stage during friction tests. All the obtained coatings showed the similar friction coefficient (similar to 0.30) at the stable stage, much lower than the untreated Al alloy (similar to 0.45). The sample nitrided under 50%N-2 + 50%H-2 exhibited the lowest wear rate, 60% lower than that of the uncoated one. The nitrided samples exhibited predominant abrasive wear and adhesive wear.