Electrical Resistance of the Al-Cu and Graphite-Fluoroplastic Multilayer Compositions

A. A. Bezhenar,Dong Zhanmin,V. S. Kopan',S. L. Revo,N. V. Hutoryanska
2013-01-01
METALLOFIZIKA I NOVEISHIE TEKHNOLOGII
Abstract:The dependence of the electrical resistivity sigma(-1) of multilayer compositions (MLC) of Al-Cu on the thickness of layer in the range h = 20-350 nm and MLC of graphite-fluoroplastic (h = 300-1600 nm) is investigated. It is shown that sigma(-1) grows with decreasing of h due to the inelastic scattering of electrons at the boundaries between layers in the MLC of Al-Cu and due to tunnelling through the gaps between the graphite particles in the MLC of graphite-fluoroplastic.
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