An Investigation of Electric Resistance of Graphene-Coated Copper Thin Film from First Principles

Manareldeen Ahmed,Er-Ping Li,Yongjian Li
DOI: https://doi.org/10.1109/icccas.2018.8768981
2018-01-01
Abstract:This paper presents an atomistic first-principles calculation of copper (Cu) coated with graphene. The resistance of copper (Cu) thin film is reduced significantly by the graphene coating. Projected density of states (PDOS) show that the C-2p orbits of graphene contribute to the total density of states (DOS) at the Fermi level which helps to increase the transmission coefficient. The resistance of the graphene-coated copper (Cu) is calculated and compared with bare copper. The results suggest that graphene enhances the transport properties of copper interconnects.
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