Growth and Structural Characteristics of Metastable Β-in 2 Se 3 Thin Films on H-terminated Si(111) Substrates by Molecular Beam Epitaxy

Yi-Fan Shen,Xi-Bo Yin,Chao-Fan Xu,Jing He,Jun-Ye Li,Han-Dong Li,Xiao-Hong Zhu,Xiao-Bin Niu
DOI: https://doi.org/10.1088/1674-1056/ab820f
2020-01-01
Chinese Physics B
Abstract:Epitaxial growth and structural characteristics of metastable β-In 2 Se 3 thin films on H-terminated Si(111) substrates are studied. The In 2 Se 3 thin films grown below the β-to-α phase transition temperature(453 K) are characterized to be strained β-In 2 Se 3 mixed with significant γ-In 2 Se 3 phases. The pure-phased single-crystalline β-In 2 Se 3 can be reproducibly achieved by in situ annealing the as-deposited poly-crystalline In 2 Se 3 within the phase equilibrium temperature window ofβ-In 2 Se 3 . It is suggeted that the observed γ-to-β phase transition triggered by quite a low annealing temperature should be a rather lowered phase transition barrier of the epitaxy-stabilized In 2 Se 3 thin-film system at a state far from thermodynamic equilibrium.
What problem does this paper attempt to address?