Fabrication and Optimization of Single-Junction Nc-Si:H N–i–p Solar Cells Using Si:H Phase Diagram Concepts Developed by Real Time Spectroscopic Ellipsometry

Xinmin Cao,Jason A. Stoke,Jian Li,Nikolas J. Podraza,Wenhui Du,Xiesen Yang,Dinesh Attygalle,Xianbo Liao,Robert W. Collins,Xunming Deng
DOI: https://doi.org/10.1016/j.jnoncrysol.2007.10.078
IF: 4.458
2008-01-01
Journal of Non-Crystalline Solids
Abstract:In this study, we have developed and applied deposition phase diagrams in the plane of the bulk layer thickness db and the H2-dilution ratio R=[H2]/[Si2H6] for Si:H materials deposited by 70MHz VHF PECVD from [H2]+[Si2H6] mixed gases on c-Si/(native-oxide)/n-layer substrates. To establish the phase diagrams, series of Si:H depositions having different R values over the range of 60–150 were measured in real time using a rotating-compensator multichannel ellipsometer. Using phase diagram concepts for guidance, we have fabricated high efficiency single-junction nc-Si:H n–i–p solar cells with ∼3Å/s intrinsic layers using the VHF PECVD process. We have found that the nc-Si:H solar cells with the best performance are obtained by incorporating i-layers deposited in the single-phase nanocrystalline silicon regime near the transition boundary to mixed-phase (a+nc)-Si:H. Applying insights from real time spectroscopic ellipsometry moreover, we have investigated in detail the effects of the phase of the underlying n-layer on the phase evolution of the overdeposited Si:H i-layer and on the overall device performance. With the strategy developed here, a stabilized efficiency of η=9.46% (Voc=0.516V, Jsc=24.65mA/cm2, FF=0.744) has been achieved for nc-Si:H solar cells (0.25cm2 in active area) fabricated with an i-layer deposition rate of ∼2.2Å/s.
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