Studies on electroplating CoNiMnP permanent film arrays

HC Jiang,JP Zhang,WL Zhang,WX Zhang,B Peng,SQ Yang
DOI: https://doi.org/10.3321/j.issn:1000-324X.2003.05.032
IF: 1.292
2003-01-01
Journal of Inorganic Materials
Abstract:Using photolithographing and electroplating techniques, CoNiMnP permanent film arrays were designed and fabricated. The microstructure, material composition and magnetic performances of the deposited film arrays were tested and analyzed. The eletroplated permanent film arrays contain 2000 magnets of 50mum x 50mum in a cubic shape on the silicon substrate of 5mm x 5mm x 0.2mm. The results show that high magnetic performances CoNiMnP permanent film arrays with vertical anisotropy can be fabricated with current density less than 10mA/cm(2) at room temperature. The deposited film array compositions are as follows: Co90.32wt%, Ni 7.83wt%, Mn 0.74wt%, P1.11wt%. The vertical direction magnetic parameters are H-c=59.7kA/m, B-r=0.53T, (BH)(max)=11.3kJ/m(3), while H-c=27.8kA/m, B-r=0.42T, (BH)(max)=3.2kJ/m(3) in the lateral direction.
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