Patterned Metal Deposition on Si Based on Self-Assembly and Inkjet Printing

Jin-Yi Wang,Sheng-Juan Huo,Wen-Bin Cai,Qun-Jie Xu

DOI: https://doi.org/10.1246/cl.2006.582

2006-01-01

Chemistry Letters

Abstract:A novel maskless and wet process for patterned metallization on a Si wafer was proposed, which incorporates an initial self-assembly of aminosilane as the organic glue layer followed by patterned i...

What problem does this paper attempt to address?

Fabricating High-Resolution Metal Pattern with Inkjet Printed Water-Soluble Sacrificial Layer

Jiazhen Sun,Yang Li,Guangping Liu,Shuoran Chen,Yang Zhang,Chen Chen,Fuqiang Chu,Yanlin Song

DOI: https://doi.org/10.1021/acsami.0c01138

2020-04-22

Abstract:The metal pattern plays a crucial role in various optoelectronic devices. However, fabrication of high-resolution metal patterns has serious problems including complicated techniques and high cost. Herein, an inkjet printed water-soluble sacrificial layer was proposed to fabricate a high-resolution metal pattern. The water-soluble sacrificial layer was inkjet printed on a polyethylene glycol terephthalate (PET) surface, and then the printed surface was deposited with a metal layer by evaporating deposition. When the deposited surface was rinsed by water, the metal layer deposited on the water-soluble sacrificial layer could be removed. Various high-resolution metal patterns were prepared, which could be used in electroluminescent displays, strain sensors, and 3D switches. This facile method could be a promising approach for fabricating high-resolution metal patterns.

materials science, multidisciplinary,nanoscience & nanotechnology
Fabrication of colloidal gold micro-patterns using photolithographed self-assembled monolayers as templates

Jun-Fu Liu,Lin-Gang Zhang,Ning Gu,Ji-Yun Ren,Yan-Peng Wu,Zu-Hong Lu,Pan-Song Mao,De-Ying Chen

DOI: https://doi.org/10.1016/S0040-6090(98)00623-3

IF: 2.1

1998-01-01

Thin Solid Films

Abstract:This paper provides a new method for the patterned metallization of self-assembled monolayers. Colloidal Au micropatterns were formed on photolithographed self-assembled monolayers (SAMs) of (3-mercaptopropyl)-trimethoxysilane (MTS) on SiO2-coated Si substrates. As confirmed by scanning electron microscopy (SEM), the colloidal Au closely replicated the mask features. Atomic force microscopy (AFM)showed that the colloidal Au particles on the unirradiated monolayers of (3-mercaptopropyl)-trimethoxysilane were connected and an almost continuous monolayer of Au nanoparticles was formed. X-ray photoelectron microscopy (XPM) revealed that the -SH terminal groups of the MTS monolayer in the exposed region were oxidized and the self-assembly of colloidal Au onto the unexposed region were through Au-S covalent bounding. The present approach may be applicable to assembly of microelectronic circuits and microbiosensors. (C) 1998 Elsevier Science S.A. All rights reserved.
Direct Patterning by Inkjet Printing 3-Mercaptopropionic Capped Nano Silver Suspension

W. Hwang,Yu Liu,M. Tsai,Yen-Fang Pai

DOI: https://doi.org/10.4028/www.scientific.net/AMR.409.508

2011-11-01

Abstract:All-printed electronics as a mean of fast processing and achieving ultra-low-cost electronic devices has attracted great interest in recent years. Inkjet printing has excelled as the most promising technique by which the circuit components can be directly drawn on the specific area in one step. Furthermore, the low temperature reduction processes can be achieved by exploit the low-melting point characteristic of nanometallic particles. The inkjet printing technique to deposit silver nanoparticles (3.39±1.21 nm) capped by saturated 3-Mercaptopropionic acid onto silicon substrate was studied. The silver patterns were tested for its functionality as circuit components like conductor, resistor and capacitor. All components can be produced simply by thermal annealing of an inkjet printed patterns under an atmosphere of 90% N2-10% H2 at 300°C for 1 hr.

Materials Science,Engineering
Dewetting-Assisted Patterning: A Lithography-Free Route to Synthesize Black and Colored Silicon

Amin Farhadi,Theresa Bartschmid,Gilles R Bourret

DOI: https://doi.org/10.1021/acsami.3c08533

2023-09-20

Abstract:We report the use of thermal dewetting to structure gold-based catalytic etching masks for metal-assisted chemical etching (MACE). The approach involves low-temperature dewetting of metal films to generate metal holey meshes with tunable morphologies. Combined with MACE, dewetting-assisted patterning is a simple, benchtop route to synthesize Si nanotubes, Si nanowalls, and Si nanowires with defined dimensions and optical properties. The approach is compatible with the synthesis of both black and colored nanostructured silicon substrates. In particular, we report the lithography-free fabrication of silicon nanowires with diameters down to 40 nm that support leaky wave-guiding modes, giving rise to vibrant colors. Additionally, micrometer-sized areas with tunable film composition and thickness were patterned via shadow masking. After dewetting and MACE, such patterned metal films produced regions with distinct nanostructured silicon morphologies and colors. To-date, the fabrication of colored silicon has relied on complicated nanoscale patterning processes. Dewetting-assisted patterning provides a simpler alternative that eliminates this requirement. Finally, the simple transfer of resonant SiNWs into ethanolic solutions with well-defined light absorption properties is reported. Such solution-dispersible SiNWs could open new avenues for the fabrication of ultrathin optoelectronic devices with enhanced and tunable light absorption.
Fabrication of nanopatterned metal layers on silicon by nanoindentation / nanoscratching and electrodeposition

R. Cecchini,A. Fabrizi,C. Paternoster,W. Zhang,G. Roventi

DOI: https://doi.org/10.1016/j.electacta.2010.01.024

2023-07-15

Abstract:The present work illustrates a novel approach for the maskless and resistless fabrication of nanopatterned metal layers on Si substrates, based on the combination of nanomechanical surface modification techniques (such as nanoindentation and nanoscratching) and electrodeposition. Single crystal (100) n-doped Si substrates were first cleaned from native oxide. Nanoindentation and nanoscratching were then used to locally change the substrate microstructure and create regions with reduced electrical conductivity. The substrates were finally mounted as cathode electrodes in a three electrode electrochemical cell to potentiostatically deposit a Ni layer. Electrodeposition was prevented in regions with modified microstructure, enabling the formation of a patterned Ni layer. The fabrication of several patterns including continuous Ni lines of 200 nm width and several microns length was obtained.

Applied Physics,Materials Science
Controlled Assembly of Patterned Gold Thin Films Using Photolithographed Self-assembled Monolayers as Templates.

Junfu Liu,Lingang Zhang,Pansong Mao,Deying Chen,Ning Gu,Jiyun Ren,Yanpeng Wu,Zuhong Lu

DOI: https://doi.org/10.1246/cl.1997.1147

1997-01-01

Chemistry Letters

Abstract:Patterned colloidal Au films were assembled from aqueous solution onto photolithographed self-assembled monolayers of (3-mercaptopropyl) trimethoxysilane films on silica. The colloidal Au closely replicated the mask patterns. The self-assembly were through Au-S covalent bounding. The present approach may be applicable to assembly of microelectronic circuits and microbiosensors.
Micro-patterning of 3-aminopropyltrimethoxy- silane self-assembled monolayers with colloidal gold

Junfu Liu,Lingang Zhang,Ning Gu,Qingyue Hong,Jiyun Ren,Yanpeng Wu,Pansong Mao,Deying Chen,Zuhong Lu

DOI: https://doi.org/10.1016/S0968-5677(98)00108-4

1998-01-01

Supramolecular Science

Abstract:This paper provides a new method to the micro-patterning of 3-aminopropyl-trimethoxysilane (ATS) self-assembled monolayers by colloidal Au. Photolithographing of ATS self-assembled monolayers on SiO2-coated Si substrates and subsequent assembly of colloidal Au to the amino terminal groups in the unirradiated regions lead to the formation of Au microstructures. As revealed by scanning electron microscopy, the colloidal Au closely replicates the mask patterns on the unirradiated regions. The present approach may be applicable to fabrication of microelectronic circuits and microbiosensors.
Gold Nanoparticle Patterning of Silicon Wafers Using Chemical E-Beam Lithography.

PM Mendes,S Jacke,K Critchley,J Plaza,Y Chen,K Nikitin,RE Palmer,JA Preece,SD Evans,D Fitzmaurice

DOI: https://doi.org/10.1021/la049803g

IF: 3.9

2004-01-01

Langmuir

Abstract:This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.
Nanometer Scale Pattern Replication Using Electron-Beam Direct Patterned Sio2 As the Etching Mask

X PAN,DR ALLEE,AN BROERS,YS TANG,CW WILKINSON

DOI: https://doi.org/10.1063/1.105770

IF: 4

1991-01-01

Applied Physics Letters

Abstract:Because of its unique properties and well-established processing techniques, SiO2 has wide application in the integrated circuit industry. The ability to directly pattern SiO2 with nanometer resolution by electron beam irradiation is therefore of great importance in the fabrication of both ultrasmall conventional and quantum devices. In this letter we demonstrate the replication of trenches with feature sizes as small as 10 nm into polycrystalline silicon and single-crystal and via reactive ion etching by using electron beam direct patterned SiO2 as the mask.
Fabrication of Nanoparticle Pattern Through Atomic Force Microscopy Tip-Induced Deposition on Modified Silicon Surfaces

JH Liao,L Huang,N Gu

DOI: https://doi.org/10.1088/0256-307x/19/1/342

2002-01-01

Chinese Physics Letters

Abstract:With an atomic force microscopy (AFM) tip used as a "nib" and gold colloidal particles as "ink", patterns of gold colloidal particles have been deposited successfully from the AFM tip onto specific regions of silicon surfaces modified by bifunctional mercaptosilane, i.e. (3-mercaptopropyl)-triethoxysilane. This was used as an adhesion agent and can immobilize nanoparticles delivered from the AFM tip onto the substrate surface.
Spatial patterning of colloidal nanoparticle-based thin film by a combinative technique of layer-by-layer self-assembly and lithography

Feng Hua,Yuri Lvov,Tianhong Cui

DOI: https://doi.org/10.1166/jnn.2002.119

Abstract:A novel approach to generating clear patterns of different types of nanoparticles is presented in this paper. Nanoassembly in the vertical direction was combined with planar micropatterning. This provides industrial applications of a popular layer-by-layer method to produce multilayers of polymers, nanoparticles, and proteins organized on the nanometer scale. A thin film of organic polystyrene spheres was first coated on the pretreated silicon wafer with layer-by-layer self-assembly. Then a layer of aluminium was deposited on the thin film. A layer of positive photoresist was spun on the surface of aluminum and then illuminated with UV light. The exposed parts of the resist were removed and windows were opened above the aluminum. The subsequent etching removed exposed aluminium and left a polystyrene thin film in the open windows. Oxygen plasma was employed to remove the polystyrene thin film on the bottom. Eventually, aluminum and photoresist were removed and only the desired pattern remained. This approach was also employed for the patterning of the silica nanoparticle thin film, a widely used material in various applications. In this case, wet etching was demonstrated to etch silica particles. A scanning electron microscope was used to produce the image of the pattern.
Large Area Nanoscale Patterning of Functional Materials Using Organosilicate ink based Nanotransfer Printing

Stephen Binderup,Venumadhav Korampally

DOI: https://doi.org/10.1088/1361-6439/ad1b1d

2024-01-05

Journal of Micromechanics and Microengineering

Abstract:This paper presents a versatile nanotransfer printing method for achieving large-area sub-micron patterns of functional materials. Organosilicate ink formulations combined with effective release layers have been shown to facilitate patterning of materials through the commonly used patterning approaches – lift off, physical etching and chemical etching. In this paper, we demonstrate that organosilicate ink formulations function as an effective resist owing to its superior physico-chemical stability whereas the release layers ensure clean removal of the resist post patterning. We successfully demonstrate patterning of sub-micron structures (800 nm feature sizes) of chromium metal through the lift off approach, silicon through reactive ion etching technique and silicon dioxide through wet chemical etching technique illustrating the versatility of the reported method. This patterning methodology represents a significant advancement in enabling nanostructure fabrication within resource-constrained laboratories. The approach requires nothing more than a master mold containing the desired structures, a spin coater, a low-temperature hotplate, and a desktop reactive ion etch tool.

engineering, electrical & electronic,nanoscience & nanotechnology,instruments & instrumentation,physics, applied
Surface wettability patterning of metal additive manufactured parts via laser-assisted functionalization

Wuji Huang,Ben Nelson,Hongtao Ding

DOI: https://doi.org/10.2351/7.0001143

IF: 2.1

2023-11-01

Journal of Laser Applications

Abstract:Additive manufacturing (AM) has revolutionized the production of complex geometries with superior properties compared with traditional manufacturing methods. However, the high roughness and poor wettability of as-produced surfaces of AM parts limit their suitability for certain applications. To address this, we present a maskless laser-assisted surface functionalization method to improve the wettability of metal 3D printed parts. This study explores the potential of combining metal AM with surface wettability patterning, a promising technique in fluid-related fields. Large-area AlSi10Mg parts were fabricated using laser powder bed fusion (L-PBF), followed by an innovative laser-assisted functionalization (LAF) method to achieve patterned wetting surfaces. The LAF method consists of laser texturing and chemical modification steps, and two strategies were demonstrated to fabricate different types of wettability patterns. Strategy I helps produce two types of superhydrophobicity, while strategy II helps create a superhydrophobic-superhydrophilic patterned surface. The study demonstrates the simplicity, robustness, and feasibility of the process and analyzes the processing mechanism, surface topography, and surface chemistry. The integration of surface wettability patterning and 3D-printing can optimize components to enhance performance and efficiency by creating intricate fluid flow pathways. Overall, this work highlights the potential of combining metal AM with surface wettability patterning, providing a pathway to produce high-performance parts with tailored wettability properties. This research has significant implications for fluid-related industries such as aerospace, automotive, and energy, as it offers unparalleled design freedom and the ability to create complex geometries.

materials science, multidisciplinary,optics,physics, applied
Nanopatterned Assembling of Colloidal Gold Nanoparticles on Silicon

Jiwen Zheng,Zihua Zhu,Haifeng Chen,Zhongfan Liu

DOI: https://doi.org/10.1021/la991332o

IF: 3.9

2000-01-01

Langmuir

Abstract:A quasi-one-dimensional (quasi-1D) Au nanocolloids array has been fabricated on silicon by combining the techniques of atomic force microscopy (AFM)-based nanooxidation and chemical assembling of colloidal nanoparticles. The silicon substrate, modified with an octadecyltrichlorosilane (OTS) monolayer, was first subjected to a localized chemical oxidation by using conductive AFM to form silicon oxide lines. After further modification of the oxidized region with an aminopropyltriethoxylsilane (APTES) monolayer via selective chemical adsorption, the substrate was exposed to a colloidal suspension of gold for deposition of gold nanoparticles. It is found that the Au nanoparticles can be selectively immobilized onto the AFM tip-defined amino-terminating regions of the silicon surface, forming quasi-1D gold nanoparticle arrays. The patterned structure is highly controllable and reproducible, which, we believe, will contribute to studies of nanodevices and mesoscopic phenomena.
Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

ZC Chen,JW Zheng,ZF Liu

DOI: https://doi.org/10.3866/pku.whxb20011002

2001-01-01

Abstract:Using gold nanoparticle as nanooxidation mask, tapping mode atomic force microscope (TM-AFM) nanolithography and wet chemical etching techniques were combined to build nanostructure on Si surface. The nanoparticles were immobilized on mercaptopropyl-trimethoxysilane (MPTS)-modified silicon surface via Au - S bonding and were exploited as the lithography mask to prevent the AFM tip-induced nanooxidation of MPTS and silicon substrate. It was found that the nanostructures formed on Si surface were dependent on the tip-sample separation. With a certain bias voltage, scanning rate and relative humidity, adjusting the separation to 7.5 nm, nanopillar structures were obtained; while decreasing the separation to 5 nm, nano-ring structures appeared. To explain the formation mechanism of these nanostructures, a hard ball model based on nanoparticle physical shielding effect was proposed.
Direct metal nano-imprinting using embossed solid electrolyte stamp

A Kumar,K H Hsu,K E Jacobs,P M Ferreira,N X Fang

DOI: https://doi.org/10.48550/arXiv.1102.1945

2011-02-09

Mesoscale and Nanoscale Physics

Abstract:In this paper, we report direct patterning of metal nanostructures using an embossed solid electrochemical stamp. Microforming of solid superionic stamps using Si templates-analogous to polymer patterning in nano-imprint lithography-is explored. Silver sulfide (Ag2S)-a superionic conductor with excellent micro-forming properties-is investigated as a candidate material. Important parameters of the superionic stamp, including mechanical behavior, material flow during forming, and feature recovery after embossing are studied. Excellent feature transferability during embossing as well as etching is observed. To illustrate the capability of this approach silver nano-antennas with gaps <10 nm were successfully fabricated. The possibility for large area patterning with stamp diameters >6 mm is also demonstrated. Embossing based metal patterning allows fabrication beyond two-dimensional nanofabrication and several patterning schemes are reported.
Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography

Xiaoguo Fang,Changxiong Zheng,Zhen Yin,Zhenming Wang,Jiawei Wang,Jianxun Liu,Dan Luo,Yan Jun Liu

DOI: https://doi.org/10.1021/acsami.9b22932

2020-03-11

Abstract:We developed an improved self-assembly method to obtain a large-area, high-quality templated monolayer mask using the polystyrene spheres. On the basis of the templated mask, hierarchically ordered Si metastructures with different nanosteps are fabricated using cyclic inductively coupled plasma etching technique. By evaporating a thin gold capping layer on these Si metastructures, their optical properties are comparatively studied using the surface-enhanced Raman scattering spectroscopy. Our proposed technique is highly promising for fabricating a variety of periodic three-dimensional hierarchically ordered metastructures, which could be further utilized for applications in SERS-based biosensors, optical absorbers, metamaterial/metasurface devices, etc.
Patterning Of Self-Assembled Monolayers By Phase-Shifting Mask And Its Applications In Large-Scale Assembly Of Nanowires

fan gao,dakuan zhang,jianyu wang,yun sheng,shancheng yan,xinran wang,kunji chen,jiancang shen,lijia pan,minmin zhou,yi shi

DOI: https://doi.org/10.1063/1.4907042

IF: 4

2015-01-01

Applied Physics Letters

Abstract:A nonselective micropatterning method of self-assembled monolayers (SAMs) based on laser and phase-shifting mask (PSM) is demonstrated. Laser beam is spatially modulated by a PSM, and periodic SAM patterns are generated sequentially through thermal desorption. Patterned wettability is achieved with alternating hydrophilic/hydrophobic stripes on octadecyltrichlorosilane monolayers. The substrate is then used to assemble CdS semiconductor nanowires (NWs) from a solution, obtaining well-aligned NWs in one step. Our results show valuably the application potential of this technique in engineering SAMs for integration of functional devices. (C) 2015 AIP Publishing LLC.
High-selectivity pattern transfer processes for self-assembled monolayer electron beam resists

D. W. Carr,M. J. Lercel,C. S. Whelan,H. G. Craighead,K. Seshadri,D. L. Allara

DOI: https://doi.org/10.1116/1.580559

1997-05-01

Abstract:Novel processes have been developed for transferring patterns using self-assembled monolayer (SAM) electron beam resists. Because the SAMs are very thin, high-selectivity processes are required for effective substrate modification. Two separate techniques have been studied for patterning intermediate layers for use as reactive ion etch (RIE) masks. A bilayer process using the native oxide as an intermediate etch mask has been used to etch into both crystalline and polycrystalline silicon. The native oxide is patterned with the SAM resist and the oxide is then used as a mask in an electron cyclotron resonance RIE. This process has been used to produce ∼25 nm etched features in silicon. Instead of its selective removal, an alternative technique for forming the intermediate etch mask layer is the selective deposition of the layer. Thin nickel layers have been formed with an electroless plating technique on silicon. The electroless deposition is highly selective for producing nickel plating on silicon as opposed to the silicon oxide. These novel high-selectivity techniques demonstrate the ability for ultrathin SAM resist layers to pattern silicon and other materials.

physics, applied,materials science, coatings & films
Fabrication of Metallic Nanopatterns with Ultrasmooth Surface on Various Substrates Through Lift-off and Transfer Process.

Cai Hongbing,Ren Wenzhen,Zhang Kun,Tian Yangchao,Pan Nan,Luo Yi,Wang Xiaoping

DOI: https://doi.org/10.1364/oe.21.032417

IF: 3.8

2013-01-01

Optics Express

Abstract:The smooth surface of the metallic nanostructure is essential for the propagation of surface plasmon polaritons. In this paper, we present a novel method to fabricate the metallic nanopatterns with ultra-smooth surface on various substrates. By using a silica film as the sacrificial layer, we show that the prefabricated metallic nanopatterns produced by electron beam lithography and film deposition can be hydrolyzed and transferred onto a designated substrate. The ultra-smooth surface morphology of nanopatterns has been characterized and verified by scanning electron microscopy and atomic force microscopy. More importantly, we demonstrate that this method can successfully produce a variety of nanostructures with high product yield, even onto the uneven substrate. The results indicate that our proposed method is a promising and versatile means to fabricate multiplicate smooth metallic nanostructure on various substrates for the application of nanophotonic devices.

Patterned Metal Deposition on Si Based on Self-Assembly and Inkjet Printing

Fabricating High-Resolution Metal Pattern with Inkjet Printed Water-Soluble Sacrificial Layer

Fabrication of colloidal gold micro-patterns using photolithographed self-assembled monolayers as templates

Direct Patterning by Inkjet Printing 3-Mercaptopropionic Capped Nano Silver Suspension

Dewetting-Assisted Patterning: A Lithography-Free Route to Synthesize Black and Colored Silicon

Fabrication of nanopatterned metal layers on silicon by nanoindentation / nanoscratching and electrodeposition

Controlled Assembly of Patterned Gold Thin Films Using Photolithographed Self-assembled Monolayers as Templates.

Micro-patterning of 3-aminopropyltrimethoxy- silane self-assembled monolayers with colloidal gold

Gold Nanoparticle Patterning of Silicon Wafers Using Chemical E-Beam Lithography.

Nanometer Scale Pattern Replication Using Electron-Beam Direct Patterned Sio2 As the Etching Mask

Fabrication of Nanoparticle Pattern Through Atomic Force Microscopy Tip-Induced Deposition on Modified Silicon Surfaces

Spatial patterning of colloidal nanoparticle-based thin film by a combinative technique of layer-by-layer self-assembly and lithography

Large Area Nanoscale Patterning of Functional Materials Using Organosilicate ink based Nanotransfer Printing

Surface wettability patterning of metal additive manufactured parts via laser-assisted functionalization

Nanopatterned Assembling of Colloidal Gold Nanoparticles on Silicon

Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

Direct metal nano-imprinting using embossed solid electrolyte stamp

Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography

Patterning Of Self-Assembled Monolayers By Phase-Shifting Mask And Its Applications In Large-Scale Assembly Of Nanowires

High-selectivity pattern transfer processes for self-assembled monolayer electron beam resists

Fabrication of Metallic Nanopatterns with Ultrasmooth Surface on Various Substrates Through Lift-off and Transfer Process.