Effective Gate Length Model for Asymmetrical Gate-All-around Silicon Nanowire Transistors

Xiaoqiao Dong,Ming Li,Wanrong Zhang,Yuancheng Yang,Gong Chen,Shuang Sun,Jianing Wang,Xiaoyan Xu,Xia An
DOI: https://doi.org/10.1007/s11432-019-2658-x
2020-01-01
Science China Information Sciences
Abstract:>Dear editor,With the development of VLSI technology,gateall-around (GAA) silicon nano wire transistor(SNWT) has emerged as one of the most potential candidates for ultimately scaled CMOS devices at the end of the technology roadmap.Some pioneering research studies have demonstrated super scalability and high performance with GAA SNWT [1-3].Whereas,in the practical fabrica-
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