An Analytic Model for Gate-All-around Silicon Nanowire Tunneling Field Effect Transistors

Liu Ying,He Jin,Chan Mansun,Du Cai-Xia,Ye Yun,Zhao Wei,Wu Wen,Deng Wan-Ling,Wang Wen-Ping
DOI: https://doi.org/10.1088/1674-1056/23/9/097102
2014-01-01
Abstract:An analytical model of gate-all-around(GAA) silicon nanowire tunneling field effect transistors(NW-TFETs) is developted based on the surface potential solutions in the channel direction and considering the band to band tunneling(BTBT) efficiency. The three-dimensional Poisson equation is solved to obtain the surface potential distributions in the partition regions along the channel direction for the NW-TFET, and a tunneling current model using Kane’s expression is developed. The validity of the developed model is shown by the good agreement between the model predictions and the TCAD simulation results.
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