Impact of Gate Asymmetry on Gate-All-Around Silicon Nanowire Transistor Parasitic Capacitance

Xiaoqiao Dong,Yuancheng Yang,Gong Chen,Shuang Sun,Qifeng Cai,Xiaokang Li,Xia An,Xiaoyan Xu,Wanrong Zhang,Ming Li
DOI: https://doi.org/10.1109/icsict.2018.8565686
2018-01-01
Abstract:In this paper, an analytical model is developed for parasitic gate capacitance of the gate-all-around (GAA) silicon nanowire MOSFETs (SNWT) with asymmetrical top and bottom gates. The modeling results show that the gate-to-source/drain spacer significantly impacts on the parasitic capacitance especially in the case of top-to-bottom gate misalignment. It is found that the optimized top-to-bottom gate misalignment may achieve smaller C p /C total so as to improve the AC performance of GAA SNWT. The developed capacitance model is more suitable for the actual process for further device design optimization.
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