Field‐Effect Transistors: A Facile and Effective Method for Patching Sulfur Vacancies of WS2 Via Nitrogen Plasma Treatment (small 36/2019)

Jianfeng Jiang,Qinghua Zhang,Aizhu Wang,Yu Zhang,Fanqi Meng,Congcong Zhang,Xianjin Feng,Yuanping Feng,Lin Gu,Hong Liu,Lin Han
DOI: https://doi.org/10.1002/smll.201970195
IF: 13.3
2019-01-01
Small
Abstract:In article number 1901791, Lin Han, Hong Liu, Lin Gu, and co-workers present a facile and effective defects-patching approach via nitrogen plasma doping for inevitable vacancies in transition metal dichalcogenides, which opens up new opportunities for the use of high-performance 2D devices in practical electronic applications. In the cover, the five-color stone in the hands of Nuwa refers to the nitrogen atom.
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