Optically Active Defect Engineering via Plasma Treatment in a MIS‐Type 2D Heterostructure (Adv. Mater. Interfaces 29/2024)

Yingjie Tao,Ran Tian,Jiayuan Zhou,Kui Chu,Xuegang Chen,Wenshuai Gao,Guopeng Wang,Yuxuan Jiang,Kenji Watanabe,Takashi Taniguchi,Mingliang Tian,Xue Liu
DOI: https://doi.org/10.1002/admi.202470072
IF: 5.4
2024-10-16
Advanced Materials Interfaces
Abstract:Defect Engineering Thanks to the existence of photo‐active defect states in h‐BN, an effective type‐II band alignment between h‐BN and WS2 monolayer is formed under 520 laser irradiations. In article 2400288 by Xue Liu and co‐workers, such lattice defects were intentionally introduced in the h‐BN layer by controlled inductively coupled plasma (ICP) treatment, which provide more driving force for the separation of electron‐hole pairs in WS2 under laser irradiation, and promote the motion of charge carriers at the WS2/ h‐BN interface.
materials science, multidisciplinary,chemistry
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