Growth and Characteristics of SiO2/Si3N4 Photonic Crystal Filter with Anti-Reflection Coatings

Kexiu Dong,Dunjun Chen,Haifan You,Yujie Wang,Yangyi Zhang,Xiaoxu Wang
DOI: https://doi.org/10.1166/nnl.2019.2953
2019-01-01
Nanoscience and Nanotechnology Letters
Abstract:One major challenge for high sensitivity and gain AlGaN heterostructure solar-blind avalanche photodiodes (APD) is visible rejection and ultraviolet (UV) absorption. In this research work, A Si3N4/SiO2 one-dimensional (1-D) photonic crystal (PC) filter with anti-reflection coatings was designed and grown on (0001) double-polished sapphire substrate using plasmas-enhanced chemical vapor deposition (PECVD), to improve the transmissivity in UV and realize the solar-blindness for AlGaN APD. The measured results showed that the thickness of each layer of the filter approached theoretical value. Moreover, the filter exhibited smooth surface with root mean square (RMS) roughness of 2.74 nm. The peak reflectivity was 98.1% at 330 nm, with stopband width of 56 nm. The reflectivity in solar-blind region was low than 5% duo to the AR coatings structure, which agreed with calculated value, which was far below the value of 1-D PC filter without AR coatings. The low reflectivity in solar-blind region effectively increased light transmission from filter into the AlGaN APD, and hence, improved the sensitivity of AlGaN APD.
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