Pinning Effect on Fermi Level in 4H-Sic Schottky Diode Caused by 40-Mev Si Ions

Jianqun Yang,Heyi Li,Shangli Dong,Xingji Li
DOI: https://doi.org/10.1109/tns.2019.2929070
IF: 1.703
2019-01-01
IEEE Transactions on Nuclear Science
Abstract:The changes in the electrical properties of 4H-SiC Schottky diodes caused by 40-MeV Si ions with different fluences are investigated. The irradiation fluences are selected as 1.0 x 10(9), 8.9 x 10(9), and 1.5 x 10(10) cm(-2), respectively. The diodes were characterized using deep-level transient spectroscopy (DLTS) and Keithley 4200-SCS semiconductor characterization system. The TRIM software is used to estimate the carbon distribution of vacancies in the irradiated 4H-SiC diodes by 40-MeV Si ions. As irradiation fluence increases, the ideality factors increase from 1.01 to 1.09, while the Schottky barrier height decreases from 1.16 to 1.09 eV. The free-carrier concentration N-d decreases with the increasing fluence from 1.0 x 10(9) to 1.5 x 10(10) cm(-2). The free-carrier removal rate is estimated to be 2.4 x 10(6) cm(-1). Experimental and simulated results show that 40-MeV Si ions produce high concentrations of displacement defects (Z(1)/Z(2) center) in the 4H-SiC, leading to the Fermi level to be pinned at the deep levels.
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