Gradient doped nickel oxide hole selective heterocontact and ultrathin passivation for silicon photovoltaics with efficiencies beyond 20%
Fengyou Wang,Hui Duan,Xin Li,Shuo Yang,Donglai Han,Lili Yang,Lin Fan,Huilian Liu,Jinghai Yang,Federico Rosei
DOI: https://doi.org/10.1016/j.cej.2022.138060
IF: 15.1
2022-07-16
Chemical Engineering Journal
Abstract:A prominent feature of photovoltaic devices is their ability to drive photo-generated charges to pathways of asymmetrical conductivity, guiding them to the corresponding electrodes. Under this guideline, the crystalline silicon (c-Si) solar cells dominate the photovoltaic (PV) market for decades and several optoelectronic losses and technological limitations are gradually emerging by now. To circumvent these issues, here, we replaced the doped-silicon emitter layer with a gradient copper-doped nickel oxide (Gd-NiO x ), and incorporated a silicon oxide passivation (SOP) layer at the Gd-NiO x /c-Si interface, to construct the novel c-Si PV devices. Interestingly, it was observed that the Gd-NiO x hole selective layer can strengthen the built-in field by minimizing the front electrode/hole-selective layer barrier width and the SOP can reduce interface recombination simultaneously, thereby yielding a remarkable 20.3% efficiency for the proof-of-concept device. We believe the design proposed in this may be of interest for applications in PVs and other optoelectronic devices.
engineering, chemical, environmental