Abstract:A two-axis Lloyd's mirrors interferometer based optical fabrication system was theoretically investigated and constructed for patterning high-uniformity nanoscale crossed grating structures over a large area with a high throughput. The current interferometer was configured with two reflected mirrors and a grating holder, which are placed edge by edge and orthogonal with each other. In such a manner, the two beams reflected from the two mirrors interfere with the incident beam, respectively, forming a crossed grating patterns with only one exposure. Differing from the conventional solution for elimination of unexpected interference between the two reflected beams, a systematical analysis, that is based on the proposed index indicating the non-orthogonality between the two beams at different incident angles, was conducted by using a spatial full polarization tracing method. Without polarization modulation to eliminate the additional interference, an optimal exposure condition with small non-orthogonality between reflected beams was found at a certain incident angle range, while the two required interferences to construct cross grating still remain high. A pattern period of ∼1 µm-level crossed grating structure could be obtained through balancing the structure area and the non-orthogonality. Finally, the exposure setup with orthogonal two-axis Lloyd's mirrors interferometer is established, and the crossed grating structure with the periods of 1076 nm along X-direction and 1091 nm along Y-direction was successfully fabricated on a silicon substrate via microfabrication technology over a large area of 400 mm2. The uniformity of crossed grating array over the whole area was evaluated by an atomic force microscope, and the standard deviations of structure periods along X- and Y-directions smaller than 0.3% are achieved. It is demonstrated that the orthogonal two-axis Lloyd's mirrors interferometer based on single-beam single-exposure scheme with non-orthogonality systematic analysis is an effective approach to fabricate crossed grating patterns of 1 µm-level period with high uniformity over a large area.

High-accuracy Alignment of the Grating Pattern along Silicon 〈1 1 2〉 Directions Using a Short Rectangular Array

Design and fabrication of 1 × 32 silica-based arrayed waveguide grating

Fabrication of ultra-high aspect ratio silicon grating using an alignment method based on a scanning beam interference lithography system

A Precision Alignment Method to &lt;100&gt; Direction on (110) Silicon Wafer

Silica-Based Arrayed Waveguide Grating With Flattened Spectral Response Using A Multimode Interference Coupler

Global Alignment Reference Strategy for Laser Interference Lithography Pattern Arrays

Silicon-Based Arrayed Waveguide Gratings for WDM and Spectroscopic Analysis Applications

Analysis and Simulation of Spatial Phase Alignment for Fabrication of Double-Layer Grating

Design and Fabrication of 8×8 Silica-Based Arrayed Waveguide Grating

Two-dimensional patterned nc-Si arrays in nanometer thick a-Si:H single layer

Athermal Silicon Arrayed Waveguide Grating With Polymer-Filled Slot Structure

Large-area commercial-grating-quality subwavelength periodic ripples on silicon efficiently fabricated by gentle ablation with femtosecond laser interference via two cylindrical lenses

Analytic Design of Segmented Phase Grating for Optical Sensing in High-Precision Alignment System

Uniform, Axial‐Orientation Alignment of One‐Dimensional Single‐Crystal Silicon Nanostructure Arrays

Polarization Dispersion Compensated Arrayed Waveguide Gratings Design Based on Silicon Nanowires

Fabrication of Slanted Grating Utilizing Reaction Ion Beam Etching: The Role of CHF<inf>3</inf> and O<inf>2</inf> Etching Atmosphere

Patterning Nanoscale Crossed Grating with High Uniformity by Using Two-Axis Lloyd's Mirrors Based Interference Lithography.

High-Performance 32-Channel Silicon Arrayed Waveguide Grating With 100 GHz Spacing

Analysis of High-Order Surface Gratings Based on Micron Lasers on Silicon

Fabrication of High Precision Self-Aligned V-Grooves Integrated on Silica-on-Silicon Chips

Surface Relief Gratings Used As Liquid Crystal Alignment Layer