Abstract:Submicrometer double-grooved gratings feature unique optical properties and diverse potential applications, most of which have been fabricated by electron beam lithography up till now. On the other hand, holographic lithography based on a phase mask [near-field holography (NFH)] has the advantages of high throughput, low cost, and a compact setup in terms of a short optical path. Distinguished from conventional NFH based on double-beam interference, multibeam NFH based on multibeam interference is studied to form groove profiles of double-grooved gratings in this study. The formation principle of double-grooved gratings is attributed to the multibeam interference of the transmitted beams behind the phase mask. Within such multibeam interference, every two of diffracted beams interfere and form several sets of latent subgrating patterns. The formation of double-grooved gratings can be understood as the superimposition of different portions of subgrating patterns. We also demonstrated the potential and challenges of several key factors in tailoring the symmetric and asymmetric double-grooved structures, including the incidence angles, the efficiency distribution of phase masks, exposure-development conditions, and the spacing between the mask and substrate. Symmetric and asymmetric double-grooved gratings with periods of 666.7, 950, and 1000 nm were fabricated by coplanar three-beam NFH at normal incidence, and coplanar four-beam NFH at oblique incidence and near normal incidence. The experimental results of the evolution of the grating profiles of double-grooved gratings are in relatively good agreement with the simulation. This study provides an alternative cost-effective fabrication method for the mass production of double-grooved gratings. Moreover, this study also enriches the diversity of groove profiles of diffraction grating by NFH.

Analysis and Simulation of Spatial Phase Alignment for Fabrication of Double-Layer Grating

Analysis of a Lloyd's Mirror Interferometer for Fabrication of Gratings

Influences of Misalignment Errors of Optical Components in an Orthogonal Two-Axis Lloyd's Mirror Interferometer.

Optimization and Fabrication of Chromium Grating in Self-Traceable Interferometer

Fabrication of Double-Grooved Gratings Using Coplanar Multibeam Holographic Lithography with a Phase Mask

Model for the Calculation of Slant Grating Alignment Signals of Room-Temperature Imprint Lithography

Double-Diffracted Spatially Separated Heterodyne Grating Interferometer and Analysis on Its Alignment Tolerance

Global Alignment Reference Strategy for Laser Interference Lithography Pattern Arrays

Analytic Design of Segmented Phase Grating for Optical Sensing in High-Precision Alignment System

Alignment Method Combining Interference Lithography with Anisotropic Wet Etch Technique for Fabrication of High Aspect Ratio Silicon Gratings.

Alignment Method for Fabricating a Parallel Flat-Field Grating Used in Soft X-Ray Region.

Fabrication Error Analysis of Nonperiodic-Multilayer-dielectric Gratings

An Alignment Method for Lift-Off on Shallow Grooves in Transparent Substrates for Integrated Dual Grating Structures

A Novel Two-Step Alignment Technique for Imprint Lithography

Simultaneous Multi-Channel Absolute Position Alignment by Multi-Order Grating Interferometry

Progress on scanning beam interference lithography tool with high environmental robustness for patterning large size grating with nanometre accuracy

Numerical Simulation of Nanolithography with the Subwavelength Metallic Grating Waveguide Structure

Fabrication of ultra-high aspect ratio silicon grating using an alignment method based on a scanning beam interference lithography system

High-accuracy Alignment of the Grating Pattern along Silicon 〈1 1 2〉 Directions Using a Short Rectangular Array

Design and Analysis of a Novel Large-Aperture Grating Device and Its Experimental Validation

Interference Lithography Based on a Phase Mask for the Fabrication of Diffraction Gratings