New Insights into Energy Efficiency of Tunnel FET with Awareness of Source Doping Gradient Variation

Cheng Chen,Qianqian Huang,Jiadi Zhu,Zhixuan Wang,Yang Zhao,Rundong Jia,Lingyi Guo,Ru Huang
DOI: https://doi.org/10.1109/ted.2018.2812828
2018-01-01
Abstract:Energy efficiency has become the main concern of IC technology. Tunnel FET (TFET) is recognized to possess the superiority of energy efficiency over MOSFET at ultralow voltage, while variability might limit the voltage reduction and thus the energy saving. Recently, device source doping gradient (SDG) is found to be the dominant variation source in TFET. In this paper, for the first time, with the awareness of SDG variation, the energy efficiency of TFET-based circuits with different activity factors ( $\alpha $ ) is comprehensively reassessed and the device optimization strategy is provided. It is found that the superiority of energy efficiency of TFET will significantly decrease especially for the more active circuit due to the inherent tradeoff between SDG variation and nominal SDG. Based on the quantitative relationship between SDG variation and nominal SDG extracted from the experimental devices, the optimal design of tunnel junction abruptness to maximize the circuit energy efficiency is obtained, leading to significant energy efficiency improvements of TFET-based circuit over MOSFET even for circuit with high $\alpha $ . This paper provides helpful device design guidelines for TFET with device variability awareness from the perspective of circuit energy efficiency.
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