Abstract:Lithography is a top-down technology to produce sub-micrometer feature sizes for the fundamental research and widespread applications. The conventional optical lithography has been developed to not only make the tiny electronic devices to form the basic circuits in today’s computer chips, but also fabricate micro/nano electromechanical systems (MEMS/NEMS). However, the conventional photolithographic techniques have now reached their ultimate spatial resolution because of both the light diffraction and the photoresist restrictions [1]. Alternative techniques for traditional photolithography have been proposed and developed to meet the requirements of a high spatial resolution of sub100 nm as well as the capability to fabricate an arbitrary structure and achieve mass production [1-10]. Research teams around the word have been investigating alternative techniques including extreme ultraviolet lithography, electron and ion beam lithography, Xray lithography and atom lithography. Each technique has its own advantages and disadvantages, and no one yet knows which one will be the method of choice for the next generation lithography (NGL). The arrays of microand nanostructures fabricated on silicon substrates have now attracted more attention for its interesting characteristics in applications such as photonics, electronics, optoelectronics and sensing [11-15]. The array properties can be tuned further by varying the geometry, the doping, the periodicity, and the size of the microand nanostructures [11,12]. These controllable and elaborate arrays are commonly fabricated by conventional optical lithography, X-ray lithography, electron-beam or ion-beam lithography [1,16-18]. Unfortunately, there are inherent limitations to pattern over large areas at nanoscale using these lithographical techniques due to the light diffraction, the long-range inter-particle interactions and the proximity effects. To overcome these limitations, it’s necessary to develop new alternative techniques with a shorter wavelength and a thinner resist for traditional optical lithography. Among the alternative techniques for traditional photolithography, atom lithography based on metastable atoms beam (MAB) and self-assembled monolayers (SAMs) has shown significant potential in fabricating arrays of microand nanostructures, which is a major goal in nanoscience and nanotechnology [10,19-29]. Metastable atom is one of the atom’s electron is

Using metastable argon atomic beam to fabricate nanostructures

Atomic Investigation on the Facet‐Dependent Melting of Ceramic Nanostructures Via in Situ Electron Irradiation

Nano-fabrication System Based on Atomic Force Microscopy

Atom Lithography: Fabricating Arrays of Silicon Microstructures Using Self-Assembled Monolayer Resist and Metastable Helium Beam

Nanostructure Generation Based on Laser Cooling and Mechanical Mask

Fabricating Artificial Nanostructures with a Scanning Tunneling Microscope

Nano-welding and Nano-Cutting with an Electron Beam

Electron Beam Lithography Application on the Nanofabrication and Nanodevice

In Situ Interfacial Manipulation of Metastable States Between Nucleation and Decomposition of Single Bismuth Nanoparticle

Nanoscale Semiconductor Processes Using STM and AFM Lithographies. Fabrication of Nanometer-to-atomic-scale Structures Using STM and AFM.

Fabrication Of Ultrafine Nanostructures With Single-Nanometre Precision In A High-Resolution Transmission Electron Microscope

Fabrication of Ultrafine Nanostructures

SPM-based Nanofabrication Using a Synchronization Technique

When the atoms dance: exploring mechanisms of electron-beam induced modifications of materials with machine-learning assisted high temporal resolution electron microscopy

Atomic Calligraphy: The Direct Writing of Nanoscale Structures using MEMS

Nanofabrication with the thermal AFM metallic tip irradiated by continuous laser

Atomic Manufacturing of Advanced Nanomaterials

Direct atomic fabrication and dopant positioning in Si using electron beams with active real time image-based feedback

Nanostructures and Nanodevices Special Fabrication and Characterization

Direct Electron Beam Writing of Nanostructures Using Passivated Gold Clusters

Effects Associated with Nanostructure Fabrication Using In Situ Liquid Cell TEM Technology