Influence of barrier layer on photoelectric properties of black silicon photodetectors

SU Yuan-jie,JIANG Ya-dong,WU Zhi-ming,ZHAO Guo-dong
DOI: https://doi.org/10.16136/j.joel.2011.10.017
2011-01-01
Abstract:This paper discusses the influence of Si 3N 4 barrier layer on photoelectric properties of black silicon photodetector. A barrier layer is added between the black silicon layer and the electrode in the metal-semiconductor-metal (MSM) structure in order to increase the Schottky barrier, leading to the decrease of the dark current. According to the experiment, under the same lighting condition, the dark current obtained by adding barrier layer is one order of magnitude lower than the one without barrier layer and decreases by one order of magnitude when the thickness of the layer adds every 30 nm, while the photo current does not change obviously. This method lowers noise current and improves the signal-to-noise ratio (SNR) of black silicon photodetector.
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