Biaxially Strained Germanium Micro-Dot Array by Hydrogen Ion Implantation

Pengfei Jia,Miao Zhang,Jun Ma,Linxi Dong,Gaofeng Wang,Paul K. Chu,Zhongying Xue,Zengfeng Di,Xi Wang
DOI: https://doi.org/10.1016/j.surfcoat.2018.07.077
2019-01-01
Abstract:Although strain engineering is an effective method to modify the bandgap of germanium for germanium -based microelectronic, the introduction of biaxial tensile strain with a particular pattern to germanium is challenging. Herein, a facile approach to produce biaxially strained germanium micro-dot arrays by hydrogen ion implantation is described. By changing the ion implantation and annealing conditions, the morphology of the micro-dots can be optimized and the biaxially tensile strain can be tuned to a maximum value of 0.6%. This method which is compatible with mainstream complementary metal-oxide-semiconductor processing can be extended to strain engineering in wafer scale.
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