Tunneling Leakage Current Reduction In Junctionless Transistors Using A Lightly Doped Region Near Drain

Wenjie Chen,Renrong Liang,Jing Wang,Jun Xu Tsinghua
DOI: https://doi.org/10.1109/isne.2018.8394684
2018-01-01
Abstract:A novel double gate junctionless transistor with a lightly doped region near drain (LD-JLT) is investigated through two-dimensional numerical simulations and compared with the conventional double gate junctionless transistor (C-JLT). Simulation results show that the OFF-state current of our proposed LD-JLT is more than eight orders smaller than that of the C-JNT due to the increased tunneling barrier width and reduced band-to-band-tunneling (BTBT) generation rate. Furthermore, the channel length dependency of the LD-JLT and the C-JLT shows that our proposed LD-JLT exhibits superior scaling capability.
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