Mechanism of Threshold Voltage Shift in ${p}$ -Gan Gate AlGaN/GaN Transistors

Xi Tang,Baikui Li,Hamid Amini Moghadam,Philip Tanner,Jisheng Han,Sima Dimitrijev
DOI: https://doi.org/10.1109/led.2018.2847669
IF: 4.8157
2018-01-01
IEEE Electron Device Letters
Abstract:In this letter, we investigate the threshold voltage (V-TH) shift in a p-GaN gate AlGaN/GaN transistor by designed gate-bias pulse measurements. It was found that the forward gate bias causes positive V-TH shift. The dynamics of electron trappingwas revealed from the dependences of the consequent V-TH shift on the bias duration at different voltages. A time constant smaller than 0.1 ms for the V-TH shift saturation at 6-V gate bias was obtained. It was also found that the V-TH became inversely proportional to the gate-bias voltages exceeding 7 V. This inverse proportionality of the V(TH)d shift resulted from the threshold of the hole-injection/electroluminescence (EL) and the sequential optical pumping effect on the electron traps. The EL emission was confirmed by a self-and in-situ photon detection measurement.
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