Total-Ionizing-Dose Radiation Effect on Dynamic Threshold Voltage in p-GaN Gate HEMTs

Xin Zhou,Zhao Wang,Zhonghua Wu,Qi Zhou,Ming Qiao,Zhaoji Li,Bo Zhang
DOI: https://doi.org/10.1109/ted.2023.3285515
IF: 3.1
2023-01-01
IEEE Transactions on Electron Devices
Abstract:In this article, total-ionizing-dose (TID) response for dynamic threshold voltage ( ${V}_{\text {TH}}{)}$ in p-GaN gate high electron mobility transistors (HEMTs) is studied. A nonmonotonic dependence of ${V}_{\text {TH}}$ on dynamic gate stress is observed and the impact mechanism of Irradiation damages in the metal/p-GaN/AlGaN system is revealed. At the p-GaN/AlGaN interface, the new interface traps built by irradiation cause more positive ${V}_{\text {TH}}$ shift. At the metal/p-GaN Schottky junction, irradiation damage related to possible nitrogen vacancies would enhance the hole-injection with increasing gate current. The hole-injection enhancement gives rise to stronger optical pumping and more holes trapped in the AlGaN barrier, causing more negative ${V}_{\text {TH}}$ shift. Irradiation damages would change the competition relationship between electron trapping and the hole-injection, which is responsible for the nonmonotonic ${V}_{\text {TH}}$ shift. The increase of gate current, drain leakage, and change of gate capacitance is presented to verify the mechanism.
engineering, electrical & electronic,physics, applied
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