Abstract:While photolithography stands as the predominant industrial methodology for the fabrication of functional three-dimensional micro-/nano-structures (3D-MNSs) in micro-/nano-devices, researchers continue to pursue an alternative avenue of using laser-induced photoelectrochemical (PEC) lithography directly on a semiconductor wafer. This innovative approach avoids the use of photoresists, auxiliary processes, and high-power laser sources. Unfortunately, the continuous use of strong chemical etchants employed in semiconductor industry, e.g. , concentrated H 2 SO 4 /H 2 O 2 or KOH solutions, poses challenges in excluding the interference of chemical etching on PEC etching processes. This challenge manifests in the notable deterioration of shape preservation, i.e. , the feature sizes of the obtained 3D-MNSs seriously deviate from the structured photo-field. To address this, we developed a laser-induced PEC lithography (PECL) approach by employing a special etchant that acts as the acceptor of photogenerated electrons without chemically reacting with gallium arsenide (GaAs). Because excessive chemical etching was avoided, the illuminated GaA wafer undergoing PEC etching by the photogenerated holes is more significant, resulting in the anticipated machining accuracy. We systematically investigated technical parameters and controllably fabricated sinusoidal holographic grating within minutes, with the grating period aligning with the structured photo-field. The mean squared error of the feature size was controlled to as low as 0.96%. Its exceptional accuracy and efficiency make PECL a competitive technique for realizing functional 3D-MNSs in semiconductor micro-optical devices.

Photoelectrochemical Microetching of N-Gaas

Diffractive Characteristics of Laser Assisted Chemical Etching GaAs

Laser Direct Writing for Micromachining of Freeform Surface on n-Type GaAs via Photoelectrochemical Etching

Morphology Control of Photoelectrochemically Etched Profiles in N-Gaas

Photoelectric e ﬀ ect accelerated electrochemical corrosion and nanoimprint processes on gallium arsenide wafers

Photoelectric effect accelerated electrochemical corrosion and nanoimprint processes on gallium arsenide wafers

Stress-Etching Using Laser Electrochemical Micromachining with Masks

Preparation and Characterization of GaN Micro/nano-Structures by the Electrodeless Photo-Assisted Chemical Etching

Photoelectrochemical (PEC) etching of Ga2O3

Laser-induced photoelectrochemical lithography

Laser micro/nano machining of silicon

Dry Etching of Germanium with Laser Induced Reactive Micro Plasma

Defect Related Photoluminescence Emission from Etched GaAs Microstructure Introduced by Electrochemical Deposition

Periodic Microstructures Fabricated by Laser Interference with Subsequent Etching

A New Method of Laser-induced Wet Etching Used for Etch Hole's Facture on GaAs Wafer

Etching Droplet Soaking and Etching Character on Surface of GaAs under Laser Irradiation

Nonaqueous Organic Electrolyte for Photoelectrochemical Etching of Gallium Nitride Surface

Demystifying metal-assisted chemical etching of GaN and related heterojunctions

Photoelectrochemical Etching of Gallium Nitride Surface by Complexation Dissolution Mechanism

Dry etching of deep air holes in GaAs/AlGaAs-based epi-wafer having InAs quantum dots for fabrication of photonic crystal laser

Thermal Etching Process of Microscale Pits on the GaAs(001) Surface