Microstructure and Growth Mechanism of Tungsten Carbide Coatings by Atmospheric CVD

Huicong Zhang,Xiaodong Yu,Zhihua Nie,Chengwen Tan,Fuchi Wang,Huaijian Cai,Ying Li,Fang Wang,Hongnian Cai

DOI: https://doi.org/10.1016/j.surfcoat.2018.03.011

IF: 4.865

2018-01-01

Surface and Coatings Technology

Abstract:A tungsten carbide coating was prepared by atmospheric chemical vapor deposition (CVD) with tungsten hexafluoride (WF6), hydrogen, and dimethyl ether (DME) as the reaction gases, under a dimethyl ether partial pressure (P-DME) of 3.2-21.0 kPa and a temperature of 550-600 degrees C. The phase compositions of the coatings are W2C + W and W3C + W, and it is found that when PDME is low, the coating has a lamellar structure, but at a high PDME, the lamellar structure and fibrous tissue are simultaneously present in the scanning electron microscope (SEM) image. In the latter case, no delamination was found, which was visible at a low Papa. In addition, as the P(DME )increases, the deposition rate of the coating decreases, and ultimately, the coating cannot continue to grow. The growth model of the tungsten carbide coating based on the kinetics of the chemical vapor deposition of tungsten by the hydrogen reduction of tungsten hexafluoride was proposed, and the influences of P-DME and temperature on the coatings were discussed and the orientation relationship between W and W2C in high resolution transmission electron microscopy (HRTEM) was analyzed.