Strain Dependent Anisotropy in Photoluminescence of Heteroepitaxial Nonpolar A-Plane ZnO Layers

Jingwen Chen,Jun Zhang,Jiangnan Dai,Feng Wu,Shuai Wang,Hanling Long,Renli Liang,Jin Xu,Changqing Chen,Zhiwu Tang,Yunbin He,Mingkai Li,Zhechuan Feng
DOI: https://doi.org/10.1364/ome.7.003944
2017-01-01
Optical Materials Express
Abstract:Nonpolar a-plane ZnO layers with anisotropic in-plane strains were prepared on the three substrates of r-sapphire, a-GaN, and a-Al0.08GaN templates via a pulsed laser deposition system, to investigate the distinguishing anisotropic photoluminescence properties of a-ZnO grown on foreign substrates. The optical anisotropy of nonpolar ZnO grown on GaN and AlGaN templates was investigated via polarization-dependent photoluminescence ( PL) measurement and polarization transmission spectra measurement. The 0.3 mu m a-ZnO layer grown on the a-GaN template has significant anisotropic optical properties with a degree of polarization ( DOP) of the photoluminescence ( PL) spectrum of about 0.8907, larger than 0.8786 of ZnO on a-Al0.08GaN or 0.8408 of a-ZnO on r-sapphire, revealing that the a-GaN may be the best candidate for the fabrication of modulators and that the increase of the Al component x of p-AlxGa1-xN will attenuate the anisotropic properties of the heteroepitaxial a-ZnO layer, providing a valuable basis for the choice of appropriate substrate for nonpolar a-plane ZnO based polarized optoelectronic devices. Moreover, the relationship between crystal quality anisotropy and optical anisotropy was proposed. (C) 2017 Optical Society of America
What problem does this paper attempt to address?