Abstract:This work demonstrated the combination of the self-assembly of a block copolymer with the well-established non-solvent induced phase separation process. Nanoporous films were obtained with well-ordered cylinder pores perpendicular to the film surfaces on top of a non-ordered bicontinous porous layer. Numerous parameters during the film formation process, including the concentration of casting solution, the solvent evaporation time, the temperature of precipitation bath, and the gate height of doctor blade, were systematically investigated to realize the effective control of surface morphology. Voronoi tessellation was first introduced to quantitatively describe the regularity of the surface pattern. It was found that the concentration of casting solution and the solvent evaporation time have synergetic influences on the porous structures. With the increase of concentration, the minimum evaporation time needed for a well-ordered porous surface decreases. If keep the concentration as a constant, the evolution of surface morphologies from non-ordered cylinder pores to ordered cylinder pores, and then to lamellar pores, was observed with the increase of evaporation time. Although lots of combinations of these two parameters can be utilized for the well-ordered structure formation, the mean pore size of the film surface didn't change significantly with the change of film preparation conditions. Besides, the decrease of the temperature of precipitation bath also helped to improve surface pattern regularity. Further study revealed that once the gate height of casting solution was decreased, the evaporation of solvent induced more significant change of casting solution concentration and the solvent composition, resulting in the disappearance of well-ordered cylinder pores. Two ways, including decreasing the solvent evaporation time and applying the solvent annealing process, were proven to be very effective to prepare thinner films with well-ordered nanoporous structures. The above results greatly broaden the operation window and provide possibilities to fabricate films suitable for different applications.

Highly-Ordered Nanoporous Thin Films from Photocleavable Block Copolymers

Highly Ordered Nanoporous Thin Films from Cleavable Polystyrene-block-poly(ethylene oxide)

Distortion of Ultrathin Photocleavable Block Copolymer Films During Photocleavage and Nanopore Formation

Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application As Locally Reactive Nanoporous Thin Films

Porous Ultra-Thin Films from Photocleavable Block Copolymers: In-Situ Degradation Kinetics Study of Pore Material

Functionalized Nanoporous Thin Films and Fibers from Photocleavable Block Copolymers Featuring Activated Esters

Line Patterns from Cylinder-Forming Photocleavable Block Copolymers.

Development of Ordered, Porous (Sub-25 nm Dimensions) Surface Membrane Structures Using a Block Copolymer Approach

Nanoporous nonwoven fibril-like morphology by cooperative self-assembly of poly(ethylene oxide)-block-poly(ethyl acrylate)-block-polystyrene and phenolic resin

Preparation and Morphology Control of Highly Ordered Nanoporous Films from Block Copolymers

Porous Films from Cyclic Block Copolymers

Nanoporous Polymer Thin Films via Polyelectrolyte Templating

Membranes with Highly Ordered Straight Nanopores by Selective Swelling of Fast Perpendicularly Aligned Block Copolymers

Perpendicular Domain Orientation In Thin Films Of Polystyrene - Polylactide Diblock Copolymers

Templating Nanoporous Polymers with Ordered Block Copolymers

Subnanometer porous thin films by the co-assembly of nanotube subunits and block copolymers.

High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

Synthesis of Semicrystalline/Fluorinated Side-Chain Crystalline Block Copolymers and Their Bulk and Thin Film Nanoordering

Assembling Vertical Block Copolymer Nanopores via Solvent Vapor Annealing on Homopolymer-Functionalized Substrates

Spatial Arrangement of Block Copolymer Nanopatterns Using a Photoactive Homopolymer Substrate

Ordered Honeycomb‐Structured Films from Dendronized PMA‐b‐PEO Rod‐Coil Block Copolymers