Line Patterns from Cylinder-Forming Photocleavable Block Copolymers.

Weiyin Gu,Hui Zhao,Qingshuo Wei,E Bryan Coughlin,Patrick Theato,Thomas P Russell
DOI: https://doi.org/10.1002/adma.201301556
2013-01-01
Abstract:A robust route for the preparation of nanoscopic line patterns from polystyrene-block-poly(ethylene oxide) featuring a photocleavable o-nitrobenzyl ester junction is demonstrated. After mild UV (λ = 365 nm) exposure and selective removal of the PEO microdomains, the polymer trench patterns are used as scaffold to fabricate highly ordered arrays of silica or Au line patterns.
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