Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application As Locally Reactive Nanoporous Thin Films

Hui Zhao,Weiyin Gu,Ryohei Kakuchi,Zhiwei Sun,Elizabeth Sterner,Thomas P. Russell,E. Bryan Coughlin,Patrick Theato
DOI: https://doi.org/10.1021/mz400389r
IF: 5.8
2013-01-01
ACS Macro Letters
Abstract:Polystyrene-block-poly(maleimide pentafluorophenyl ester-co-styrene)-block-poly(ethylene oxide) with an o-nitrobenzyl ester junction was synthesized by "one-step" RAFT polymerization. Highly ordered and locally reactive nanoporous thin films were obtained from the photocleavable triblock copolymer after spin coating, solvent annealing, UV exposure, and washing with methanol/water to remove the minor block PEO. The local reactivity in the thin films was demonstrated by fabrication of iron oxide nanotori after post-modification with an amino-functionalized ferrocene and treatment with oxygen plasma.
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