Simulation of Nano-Scale Double Gate In0.53Ga0.47As Nmosfets by a Deterministic BTE Solver

Shaoyan Di,Kai Zhao,Zhiyuan Lun,Tiao Lu,Gang Du,Xiaoyan Liu
DOI: https://doi.org/10.1109/vlsi-tsa.2016.7480516
2016-01-01
Abstract:A nano-scale double gate In0.53Ga0.47As nMOSFET device structure is simulated by deterministically solving the time dependent Boltzmann Transport Equation (BTE). The results show that the contribution of the L valleys cannot be ignored even if the energy gap between r and L valleys are very large. Moreover, the quasi-ballistic transport is observed despite the existence of scattering.
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