Performance comparison of Si, III–V double-gate n-type MOSFETs by deterministic Boltzmann transport equation solver

Shaoyan Di,Lei Shen,Pengying Chang,Kai Zhao,Tiao Lu,Gang Du,Xiaoyan Liu
DOI: https://doi.org/10.7567/JJAP.56.04CD08
IF: 1.5
2017-01-01
Japanese Journal of Applied Physics
Abstract:A deterministic time-dependent Boltzmann transport equation (BTE) solver is employed to carry out a comparison work among 10 nm double-gate n-type MOSFETs with channel materials of Si, In0.53Ga0.47As, and GaSb in different surface orientations. Results show that the GaSb device has the highest drive current, while scattering affects carrier transport in the Si device the most. The InGaAs device exhibits the highest injection velocity but suffers from the density of state (DOS) bottleneck seriously. (c) 2017 The Japan Society of Applied Physics
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