Thermally Assisted Nonvolatile Memory in Monolayer MoS2 Transistors

G. He,H. Ramamoorthy,C. -P. Kwan,Y. -H. Lee,J. Nathawat,R. Somphonsane,M. Matsunaga,A. Higuchi,T. Yamanaka,N. Aoki,Y. Gong,X. Zhang,R. Vajtai,P. M. Ajayan,J. P. Bird
DOI: https://doi.org/10.1021/acs.nanolett.6b02905
IF: 10.8
2016-01-01
Nano Letters
Abstract:We demonstrate a novel form of thermally-assisted hysteresis in the transfer curves of monolayer MoS2 FETs, characterized by the appearance of a large gate-voltage window and distinct current levels that differ by a factor of ∼102. The hysteresis emerges for temperatures in excess of 400 K and, from studies in which the gate-voltage sweep parameters are varied, appears to be related to charge injection into the SiO2 gate dielectric. The thermally-assisted memory is strongly suppressed in equivalent measurements performed on bilayer transistors, suggesting that weak screening in the monolayer system plays a vital role in generating its strongly sensitive response to the charge-injection process. By exploiting the full features of the hysteretic transfer curves, programmable memory operation is demonstrated. The essential principles demonstrated here point the way to a new class of thermally assisted memories based on atomically thin two-dimensional semiconductors.
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