MoS 2 Field-Effect Transistors with Lead Zirconate-Titanate Ferroelectric Gating

Xiao-Wen Zhang,Dan Xie,Jian-Long Xu,Yi-Lin Sun,Xian Li,Cheng Zhang,Rui-Xuan Dai,Yuan-Fan Zhao,Xin-Ming Li,Xiao Li,Hong-Wei Zhu
DOI: https://doi.org/10.1109/led.2015.2440249
IF: 4.8157
2015-01-01
IEEE Electron Device Letters
Abstract:We report back gate field-effect transistors (FETs) with few-layered MoS2 nanosheet controlled by lead-zirconate-titanate (PZT) ferroelectric gating. The MoS2 transistors with PZT gating (MoS2-PZT FETs) exhibit reproducible hysteresis and nonvolatile memory behaviors with high stability, which can be attributed to the polarization screening from interface adsorbates and charge dynamic trapping/detrapping into the interface defect states. The ON/OFF states ratios and memory windows have little change with the channel scaling from 2 mu m to 200 nm, revealing the channel scaling has not obvious influence on MoS2-PZT FET properties, which suggests MoS2-PZT FET a promising candidate for future non-volatile memory applications.
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