In‐plane ferroelectrics enabling reduced hysteresis in monolayer MoS2 transistors

Mingxuan Yuan,Binbin Zhang,Jiliang Cai,Jiaqi Zhang,Yue Lu,Shuo Qiao,Kecheng Cao,Hao Deng,Qingqing Ji
DOI: https://doi.org/10.1002/cnl2.148
2024-06-19
Carbon Neutralization
Abstract:Van der Waals integration of monolayer MoS2 transistors with in‐plane ferroelectric NbOCl2 enables nearly hysteresis‐free output and transfer characteristics, thanks to the compensatory interplay between electromigration and polarization currents in MoS2 and NbOCl2, respectively. Two‐dimensional (2D) semiconductors, such as monolayer MoS2, has emerged as a profound material platform in the post‐Moore era due to their versatile applications for high‐performance transistors, memories, photodetectors, neuristors, and so on. Nevertheless, the inherent defects in these atomically thin materials have given rise to significant hysteresis in their field‐effect transistors (FETs), resulting in shifted threshold voltages and elevated power consumptions not only on single‐device levels but also at circuitry scales. We herein report that, by vertically integrating an in‐plane ferroelectric, NbOCl2, with monolayer MoS2 FETs, the hysteresis in both the output and transfer curves of the latter can be greatly suppressed, which we attribute to compensated electromigration currents by the polarization currents of the 2D ferroelectric. This work opens a new avenue to hysteresis‐free 2D transistors without necessitating defect‐free channels, thus allowing for their use in high driving‐voltage scenarios such as power electronics.
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