Process Research of Copper Inductors on OPS Insulating Layer

陈忠民,刘泽文,刘理天,李志坚
2004-01-01
Abstract:A novel process for realizing a copper inductor on oxidized porous silicon (OPS) insulating layer is presented. The combination of thick OPS insulating layer and copper coils can reduce the parasitic loss and effectively improve the Q factor of inductors due to OPS is a low loss material and copper has a high conductivity. The OPS layers are prepared by a two-step oxidation of porous silicon (PS) with porosities beyond 56%. The copper coils are formed with the processing method of seed layer sputtering / lithography / copper electroplating / seed layer etching. As a result,(1 nH) copper planar inductor on OPS layer is realized. Its Q factor is 9 at (10 GHz) and the self-resonant frequency beyond 20 GHz.
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