Recent Advances in Research on p-Type ZnO

叶志镇,张银珠,徐伟中,吕建国
DOI: https://doi.org/10.3321/j.issn:1000-324X.2003.01.002
IF: 1.292
2003-01-01
Journal of Inorganic Materials
Abstract:ZnO is a novel material for II-VI semiconductor. Researches indicate that n-type ZnO films can be well prepared, this is due to the high self-compensating process on doping derived from the intrinsic donor defects such as oxygen vacancy (V-O) and zinc interstitial (Zn-i) atoms, so n-typed ZnO films are formed naturally and p-type ZnO films are difficult to be prepared. How to realize p-type ZnO films through doping is the key step for application in the fields of ZnO-based opoelectrical devices, in which great progresses have been made now. This paper summarized the recent advances in research on p-type ZnO.
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