Investigation of positive roles of hydrogen plasma treatment for interface passivation based on silicon heterojunction solar cells

Liping Zhang,Wanwu Guo,W. Liu,Jian Bao,Jinning Liu,Jianhua Shi,Fanying Meng,Zhengxin Liu
DOI: https://doi.org/10.1088/0022-3727/49/16/165305
2016-01-01
Abstract:The positive roles of H-2-plasma treatment (HPT) have been investigated by using different treatment procedures in view of the distinctly improved passivation performance of amorphous-crystalline silicon heterojunctions (SHJs). It has been found that a hydrogenated amorphous silicon thin film and crystalline silicon (a-Si: H/c-Si) interface with a high stretching mode (HSM) is detrimental to passivation. A moderate pre-HPT introduces atomic H, which plays an effective tuning role in decreasing the interfacial HSM; unfortunately, an epitaxial layer is formed. Further improvement in passivation can be achieved in terms of increasing the HSM of a-Si: H film treated by appropriate post-HPT based on the a-Si: H thickness. The minority carrier lifetime of crystalline wafers can be improved by treated films containing a certain quantity of crystallites. The microstructure factor R and the maximum intensity of the dielectric function epsilon(2max) have been found to be critical microstructure parameters that describe high-quality a-Si: H passivation layers, which are associated with the amorphous-to-microcrystalline transition phase induced by multi-step HPT. Finally, the open circuit voltage and conversion efficiency of the SHJ solar cell can be improved by implementing an effective HPT process.
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