High-Performance Back-Channel-Etched Thin-Film Transistors With Amorphous Si-Incorporated Sno2 Active Layer

Xianzhe Liu,Honglong Ning,Jianqiu Chen,Wei Cai,Shiben Hu,Ruiqiang Tao,Yong Zeng,Zeke Zheng,Rihui Yao,Miao Xu,Lei Wang,Linfeng Lan,Junbiao Peng
DOI: https://doi.org/10.1063/1.4944639
IF: 4
2016-01-01
Applied Physics Letters
Abstract:In this report, back-channel-etched (BCE) thin-film transistors (TFTs) were achieved by using Si-incorporated SnO2 (silicon tin oxide (STO)) film as active layer. It was found that the STO film was acid-resistant and in amorphous state. The BCE-TFT with STO active layer exhibited a mobility of 5.91 cm(2)/V s, a threshold voltage of 0.4 V, an on/off ratio of 10(7), and a steep subthreshold swing of 0.68 V/decade. Moreover, the device had a good stability under the positive/negative gate-bias stress. (C) 2016 AIP Publishing LLC.
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