Improved Ultraviolet Emission Performance from Polarization-Engineered N-Zno/P-Gan Heterojunction Diode

Junyan Jiang,Yuantao Zhang,Chen Chi,Zhifeng Shi,Long Yan,Pengchong Li,Baolin Zhang,Guotong Du
DOI: https://doi.org/10.1063/1.4941230
IF: 4
2016-01-01
Applied Physics Letters
Abstract:O-polar ZnO films were grown on N-polar p-GaN/sapphire substrates by photo-assisted metal-organic chemical vapor deposition, and further heterojunction light-emitting diodes based O-polar n-ZnO/N-polar p-GaN were proposed and fabricated. It is experimentally demonstrated that the interface polarization of O-polar n-ZnO/N-polar p-GaN heterojunction can shift the location of the depletion region from the interface deep into the ZnO side. When a forward bias is applied to the proposed diode, a strong and high-purity ultraviolet emission located at 385 nm can be observed. Compared with conventional Zn-polar n-ZnO/Ga-polar p-GaN heterostructure diode, the ultraviolet emission intensity of the proposed heterojunction diode is greatly enhanced due to the presence of polarization-induced inversion layer at the ZnO side of the heterojunction interface. This work provides an innovative path for the design and development of ZnO-based ultraviolet diode.
What problem does this paper attempt to address?