Gate Defined Quantum Dot Realized in a Single Crystalline InSb Nanosheet

Jianhong Xue,Yuanjie Chen,Dong Pan,Ji-Yin Wang,Jianhua Zhao,Shaoyun Huang,H. Q. Xu
DOI: https://doi.org/10.1063/1.5064368
IF: 4
2019-01-01
Applied Physics Letters
Abstract:A single crystalline InSb nanosheet is an emerging planar semiconductor material with potential applications in electronics, infrared optoelectronics, spintronics, and topological quantum computing. Here, we report on the realization of a quantum dot device from a single crystalline InSb nanosheet grown by molecular-beam epitaxy. The device is fabricated from the nanosheet on a Si/SiO2 substrate, and quantum dot confinement is achieved by the top gate technique. Transport measurements of the device are carried out at a low temperature in a dilution refrigerator. It is found that the measured charge stability diagram is characterized by a series of small Coulomb diamonds at high plunger gate voltages and a series of large Coulomb diamonds at low plunger gate voltages, demonstrating the formation of a gate-tunable quantum dot in the InSb nanosheet. Gate-defined planar InSb quantum dots offer a renewed platform for developing semiconductor-based quantum computation technology.
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