Improving the High-Frequency Magnetic Properties of As-Deposited CoFe Films by Ultra-Low Gas Pressure

XiaoLi Tang,You Yu,Hua Su,HuaiWu Zhang,ZhiYong Zhong,YuLan Jing
DOI: https://doi.org/10.1007/s10853-017-1794-y
IF: 4.5
2018-01-01
Journal of Materials Science
Abstract:CoFe films without buffer layers were deposited at different ultra-low argon pressures ranging from 0.085 to 0.847 mTorr. This pressure range was one to two orders lower than the normal sputtering pressure. As a consequence, the static magnetic properties, including coercivity and magnetic anisotropy field, were improved with decrease argon pressure. The high-frequency permeability spectra showed that the resonance frequency and the damping factor of the films also reached optimal values at ultra-low pressure. Basing on atomic force microscopy observations, we attributed the excellent properties to the improved morphologies of the films and released internal stress.
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