Abstract:FeCoN soft magnetic thin films with various nitrogen contents were fabricated by varying the gas flow rates of the argon and nitrogen gas mixture used during reactive rf magnetron sputtering. It was found that the resistivity of FeCoN film increased up to 211 μΩ cm with increasing nitrogen content. The film produced at the gas flow rate of 7 sccm exhibited the best soft magnetic properties with small coercivity and relatively large saturation magnetization. The microstructure of the films was examined by high-resolution transmission electron microscopy and α″-FeCo phase with very high saturation magnetization was observed in the films. The high-frequency properties of the FeCoN thin films were experimentally characterized and theoretically examined. The Hoffmann’s ripple theory was used to explain the permeability spectra for the films with strong magnetization dispersion. We found that the ripple effect is responsible for the large damping in the films, and those films with larger coercivities have stronger magnetization dispersion. With the gas flow rate of the argon and nitrogen gas mixture increasing from 0 to 15 sccm, the low-frequency permeability decreased from 680 to 245 and the ferromagnetic resonance frequency increased from 2.09 to 2.99 GHz.

Tuning of the Magnetization Dynamics in As-Sputtered FeCoSiN Thin Films by Various Sputtering Gas Pressures

Influence of Si Concentration on the Magnetization Dynamics in As-Sputtered FeCoSiN Thin Films at High Frequencies

Influence of Cu underlayer on the high-frequency magnetic characteristics of as-sputtered FeCoSiN granular thin films

High-frequency Permeability Spectra of FeCoSiN/Al2O3 Laminated Films: Tuning of Damping by Magnetic Couplings Dependent on the Thickness of Each Ferromagnetic Layer

Influences of Sputtering Gas Pressure and Gas Flow Rate on Microwave Characteristics of Fecoalo Thin Films

Ultrawide frequency linewidth of the permeability spectra of FeCoN thin film sputtered on the flexible substrate

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Tuning the Magnetization Dynamics in Sputtered ${\hbox{Co}}_{2}{\hbox{FeAl}}_{0.5}{\hbox{Si}}_{0.5}$ Heusler Alloy Thin Film by Gas Pressure

Tuning of the Intrinsic Magnetic Damping Parameter in Epitaxial CoNi(001) Films : Role of the Band-Filling Effect

Tuning of Soft Magnetic Properties in FeCoHfO Thin Films by Various Sputtering Power and Pressure

Influence of Sputtering Power on the High Frequency Properties of Nanogranular FeCoHfO Thin Films

Improving the High-Frequency Magnetic Properties of As-Deposited CoFe Films by Ultra-Low Gas Pressure

Comparative Study of the Tribology of Amorphous Carbon Films Via Magnetron Sputtering Depending on the Different Magnetic Field

The Effects of the Working Gas Pressure and Magnetic Bias Field on the Stress Impedance Properties of FeCoSiB Magnetoelastic Thin Film

Influence of Total Film Thickness on High-Frequency Magnetic Properties of the [fecosin/sinx]n Multilayer Thin Films

Influence Of Multiple Magnetic Phases On The Extrinsic Damping Of Feco-Sio2 Soft Magnetic Films

High Frequency Characteristics of Fecon Thin Films Fabricated by Sputtering at Various (Ar+n-2) Gas Flow Rates

Damping in Magnetization Dynamics of Single-Crystal Fe3o4/Gan Thin Films

Role of Magnetostrictive Effect in Magnetization Dynamics of SmFe Thin Films

Stress Impedance Effects of FeCoSiB Films Deposited on Flexible Substrates

High-Frequency Properties and Thickness-Dependent Damping Factor of ${\rm FeCo}{\hbox{–}}{\rm SiO}_{2}$ Thin Films